⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7212323 | 0.83 | TSHR (0.39) | — | |
| SCHEMBL16287679 | 0.80 | FDPS (0.33) | — | |
| SCHEMBL9568335 | 0.80 | — | — | |
| SCHEMBL27868557 | 0.78 | — | — | |
| SCHEMBL28353706 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL7056825 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL27948565 | 0.76 | SMPD1 (0.32) | — | |
| SCHEMBL5697594 | 0.75 | HSD17B10 (0.32) | — | |
| SCHEMBL11289016 | 0.75 | — | — | |
| SCHEMBL2972819 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3833645-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP Applied Technologies Inc. (US) | 2021-06-16 | — | — | EP | claimed |
| WO-2020033935-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP APPLIED TECHNOLOGIES INC. (US) | 2020-02-13 | — | — | WO | claimed |
| US-20200048148-A1 | Efficient Formulation Stable Crude Glycerine Grinding Additive | GCP APPLIED TECH INC (US) | 2020-02-13 | — | — | US | claimed |
| EP-0125344-A2 | A gellation resistant aqueous glycol composition | TEXACO DEVELOPMENT CORPORATION (US) | 1984-11-21 | — | — | EP | claimed |
| CN-122054878-A | Method for manufacturing light-emitting device, negative-type radiation-sensitive composition, cured film, and organic EL device | JSR株式会社 | 2026-05-15 | — | — | CN | disclosed |
| US-20260026281-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| WO-2025033138-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING UNDERLAYER FILM FOR METAL-CONTAINING RESIST | JSR株式会社 | 2025-02-13 | — | — | WO | disclosed |
| US-20250044701-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING COMPOSITION | JSR CORPORATION (JP) | 2025-02-06 | — | — | US | disclosed |
| WO-2025009380-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND REVERSAL PATTERN FORMING MATERIAL | JSR株式会社 | 2025-01-09 | — | — | WO | disclosed |
| WO-2024203400-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION FOR METAL-CONTAINING RESIST | JSR株式会社 | 2024-10-03 | — | — | WO | disclosed |
| WO-2024205936-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | INPRIA CORPORATION (US) | 2024-10-03 | — | — | WO | disclosed |
| US-20240319599-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | JSR CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| US-20220146940-A1 | COMPOSITION, SILICON-CONTAINING FILM, METHOD OF FORMING SILICON-CONTAINING FILM, AND METHOD OF TREATING SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| EP-3833645-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP Applied Technologies Inc. (US) | 2021-06-16 | — | — | EP | disclosed |
| US-20200048148-A1 | Efficient Formulation Stable Crude Glycerine Grinding Additive | GCP APPLIED TECH INC (US) | 2020-02-13 | — | — | US | disclosed |
| WO-2020033935-A1 | EFFICIENT FORMULATION STABLE CRUDE GLYCERINE GRINDING ADDITIVE | GCP APPLIED TECHNOLOGIES INC. (US) | 2020-02-13 | — | — | WO | disclosed |
| US-6297206-B2 | Combination surfactant systems for use in carbon dioxide-based cleaning formulations | MICELL TECHNOLOGIES, INC. | 2001-10-02 | — | — | US | disclosed |
| US-20010009894-A1 | Combination surfactant systems for use in carbon dioxide-based cleaning formulations | ROMACK TIMOTHY J (US) | 2001-07-26 | — | — | US | disclosed |
| US-6200943-B1 | Combination surfactant systems for use in carbon dioxide-based cleaning formulations | MICELL TECHNOLOGIES, INC. | 2001-03-13 | — | — | US | disclosed |
| US-5200477-A | Having antiagglomerant inert particles with an organomodified polysiloxane present during the vapor phase polymerization to produce synthetic rubbers using a coordination catalyst | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1993-04-06 | — | — | US | disclosed |