Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK14 | Q16539 | 11/20 | 0.67 |
| ▸ | MAPK13 | O15264 | 8/20 | 0.67 |
| ▸ | MAPK12 | P53778 | 8/20 | 0.67 |
| ▸ | MAPK11 | Q15759 | 8/20 | 0.67 |
| ▸ | RAF1 | P04049 | 3/20 | 0.67 |
| ▸ | GCGR | P47871 | 5/20 | 0.64 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.60 |
| ▸ | TP53 | P04637 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | TEK | Q02763 | 2/20 | 0.54 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15452429 | 0.91 | MAPK14 (0.72) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL3454813 | 0.87 | MAPK14 (0.71) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL12269393 | 0.87 | MAPK14 (0.67) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL10083168 | 0.87 | MAPT (0.70) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL6467858 | 0.87 | MAPK14 (0.74) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL29363034 | 0.83 | TEK (0.70) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL942701 | 0.83 | TEK (0.70) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL11212515 | 0.82 | MAPK13 (0.76) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL6464698 | 0.82 | NOX1 (0.74) | MAPK14MAPK13MAPK12MAPK11RAF1 | |
| SCHEMBL28221004 | 0.81 | MAPT (0.56) | MAPK14MAPK13MAPK12MAPK11RAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109591409-A | Film anti-fake material and preparation method | 深圳市深大极光科技有限公司 | 2019-04-09 | — | — | CN | disclosed |
| CN-103365079-B | Light shield layer forms the manufacturing method with photonasty substrate composition | 东京应化工业株式会社 | 2018-10-26 | — | — | CN | disclosed |
| CN-105899502-A | Photoinitiator and photosensitive composition comprising same | 塔科玛技术股份有限公司 | 2016-08-24 | — | — | CN | disclosed |
| CN-105676601-A | Pretreatment method of glass substrate used for forming etching mask | 东京应化工业株式会社 | 2016-06-15 | — | — | CN | disclosed |
| CN-105467756-A | Photosensitive resin compound | TOKYO OHKA KOGYO CO LTD | 2016-04-06 | — | — | CN | disclosed |
| CN-103376650-B | Light shield layer forms the manufacture method with photonasty substrate composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-02 | — | — | CN | disclosed |
| CN-104641294-A | Negative photosensitive resin composition | NISSAN CHEMICAL IND LTD | 2015-05-20 | — | — | CN | disclosed |
| EP-1158025-A2 | Resin composition for color filter | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |