SCHEMBL7804656

SCHEMBL7804656

CCC(c1ccc(O)cc1)(c1ccc(O)cc1)c1ccc(C(C)(C)c2ccc(O)cc2)cc1

nearest known ligand 0.70

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 15/20 0.70
ESR2 Q92731 13/20 0.70
CYP3A4 P08684 3/20 0.70
AR P10275 1/20 0.70
HPGD P15428 1/20 0.70
TSHR P16473 1/20 0.70
SLC6A2 P23975 1/20 0.70
SLC6A4 P31645 1/20 0.70
HTR6 P50406 1/20 0.70
ESRRG P62508 1/20 0.70
SLC6A3 Q01959 1/20 0.70
HSD17B10 Q99714 1/20 0.70
ALDH1A1 P00352 2/20 0.59
LMNA P02545 1/20 0.50
TYR P14679 1/20 0.50
SHBG P04278 1/20 0.47
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17897783 0.92 ESR1 (0.59) ESR1ESR2CYP3A4ARHPGD
SCHEMBL505601 0.91 ESR1 (0.65) ESR1ESR2CYP3A4ARHPGD
SCHEMBL12004549 0.84 ESR1 (0.58) ESR1ESR2CYP3A4ARHPGD
SCHEMBL10772677 0.84 ESR1 (0.58) ESR1ESR2CYP3A4ARHPGD
Bisphenol A SCHEMBL4231382 0.84 ESR1 (0.80) ESR1ESR2CYP3A4ARHPGD
Bisphenol A SCHEMBL9774987 0.83 ESR1 (1.00) ESR1ESR2CYP3A4ARHPGD
Bisphenol A SCHEMBL3170263 0.83 ESR1 (1.00) ESR1ESR2CYP3A4ARHPGD
Bisphenol A SCHEMBL8058731 0.83 ESR1 (1.00) ESR1ESR2CYP3A4ARHPGD
SCHEMBL7806611 0.83 ESR1 (0.64) ESR1ESR2CYP3A4ARHPGD
Bisphenol A SCHEMBL15062 0.83 ESR1 (1.00) ESR1ESR2CYP3A4ARHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3954745-B1 REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME KK PILOT CORPORATION ALSO TRADING AS PILOT CORPORATION (JP) 2026-01-07 EP disclosed
US-20160195810-A1 POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2016-07-07 US disclosed
US-9239518-B2 Photosensitive resin composition and method of forming pattern using the same SAMSUNG DISPLAY CO., LTD. (KR) 2016-01-19 US disclosed
US-9239518-B2 Photosensitive resin composition and method of forming pattern using the same SAMSUNG DISPLAY CO., LTD. (KR) 2016-01-19 US disclosed
US-20140234776-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-08-21 US disclosed
US-20140234776-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-08-21 US disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed