SCHEMBL7809707

SCHEMBL7809707

CCC(c1ccccc1O)c1ccccc1C(C)(c1ccccc1O)c1ccccc1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.49
ALDH1A1 P00352 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
POLB P06746 1/20 0.41
GABRA1 P14867 1/20 0.40
GABRB2 P47870 1/20 0.40
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
BCHE P06276 2/20 0.36
TYR P14679 2/20 0.36
ACHE P22303 2/20 0.36
RORC P51449 1/20 0.35
KIF11 P52732 1/20 0.35
ALOX15 P16050 1/20 0.34
HPGD P15428 2/20 0.33
GPR84 Q9NQS5 1/20 0.33
HKDC1 Q2TB90 1/20 0.33
LMNA P02545 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7876488 0.83 TSHR (0.47) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL29860994 0.82 TSHR (0.68) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL296591 0.82 TSHR (0.68) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL7876811 0.81 TSHR (0.46) TSHRALDH1A1TDP1POLBGABRA1
Ammonia Solution, Strong SCHEMBL28876892 0.80 TSHR (0.65) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL7809655 0.80 TSHR (0.65) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL7804648 0.80 TSHR (0.45) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL7593818 0.79 ALDH1A1 (0.54) TSHRALDH1A1TDP1POLBGABRA1
SCHEMBL11418774 0.78 TSHR (0.57) TSHRALDH1A1POLBGABRA1GABRB2
Bicarbonate SCHEMBL7033903 0.77 TSHR (0.61) TSHRALDH1A1POLBGABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed