Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PDE4A | P27815 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | MMP1 | P03956 | 2/20 | 0.32 |
| ▸ | MMP2 | P08253 | 2/20 | 0.32 |
| ▸ | MMP9 | P14780 | 2/20 | 0.32 |
| ▸ | MMP8 | P22894 | 2/20 | 0.32 |
| ▸ | MMP13 | P45452 | 2/20 | 0.32 |
| ▸ | APP | P05067 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775639 | 0.93 | CA2 (0.35) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL5492453 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL5489306 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL5485770 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL1823999 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL1827053 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL1827987 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL1826986 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL1826363 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL158885 | 0.91 | CA2 (0.38) | PTGS1PDE4ALMNASLC6A6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1686425-B1 | METHOD FOR FORMING MULTILAYER RESIST | DAIKIN IND LTD (JP) | 2018-06-13 | — | — | EP | disclosed |
| US-9343777-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2016-05-17 | — | — | US | disclosed |
| US-9252457-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-20120177988-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120070731-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20090325065-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-12-31 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20070196763-A1 | Method of forming laminated resist | DAIKIN INDUSTRIES, LTD. | 2007-08-23 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| CN-1882882-A | Method for forming multilayer resist | DAIKIN IND LTD (JP) | 2006-12-20 | — | — | CN | disclosed |
| EP-1686425-A1 | METHOD FOR FORMING MULTILAYER RESIST | Daikin Industries, Ltd. (JP) | 2006-08-02 | — | — | EP | disclosed |