SCHEMBL785642

SCHEMBL785642

C=CC(=O)OCC(=O)N1OCC2C3CC(C4CCCC34)C21

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CTDSP1 Q9GZU7 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12837482 0.80 SRC (0.30)
SCHEMBL775295 0.74 ALDH1A1 (0.30) CTDSP1TDP1L3MBTL1
SCHEMBL17300170 0.68 TSHR (0.37)
SCHEMBL15082708 0.68 TSHR (0.37)
SCHEMBL14539616 0.64 TSHR (0.38)
SCHEMBL12837506 0.64 CHRM2 (0.32)
SCHEMBL14192764 0.63 TSHR (0.38)
SCHEMBL774836 0.61 HTT (0.34) CTDSP1TDP1L3MBTL1
SCHEMBL25646652 0.61 TSHR (0.44)
SCHEMBL7857605 0.61 TSHR (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed