SCHEMBL7863846

SCHEMBL7863846

CCCCCC(C)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15508739 1.00
SCHEMBL22159973 0.97 OPRM1 (0.50)
SCHEMBL20957517 0.97 OPRM1 (0.50)
SCHEMBL14209271 0.97
SCHEMBL21462877 0.97 OPRM1 (0.50)
SCHEMBL20957530 0.97 OPRM1 (0.50)
SCHEMBL20957513 0.97 OPRM1 (0.50)
SCHEMBL20957531 0.97 OPRM1 (0.50)
SCHEMBL20957521 0.97 OPRM1 (0.50)
SCHEMBL20957532 0.97 OPRM1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4684045-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES Versum Materials US, LLC (US) 2026-01-28 EP claimed
WO-2024215931-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES VERSUM MATERIALS US, LLC (US) 2024-10-17 WO claimed
EP-4684045-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES Versum Materials US, LLC (US) 2026-01-28 EP disclosed
US-12391645-B2 N-isopropyl tryptamines and method of making monoalkylated and dialkylated tryptamine analogs CAAMTECH, INC. (US) 2025-08-19 US disclosed
US-20250250675-A1 METHOD OF DEPOSITING METAL FILMS APPLIED MATERIALS, INC. (US) 2025-08-07 US disclosed
US-20250197352-A1 N-ISOPROPYL TRYPTAMINES AND METHOD OF MAKING MONOALKYLATED AND DIALKYLATED TRYPTAMINE ANALOGS CAAMTECH, INC. 2025-06-19 US disclosed
US-12281387-B2 Method of depositing metal films APPLIED MATERIALS, INC. (US) 2025-04-22 US disclosed
EP-4525861-A2 N-ISOPROPYL TRYPTAMINES AND METHOD OF MAKING MONOALKYLATED AND DIALKYLATED TRYPTAMINE ANALOGS Caamtech, Inc. (US) 2025-03-26 EP disclosed
WO-2024215931-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES VERSUM MATERIALS US, LLC (US) 2024-10-17 WO disclosed
CN-111954848-B Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member DIC株式会社 2024-05-03 CN disclosed
WO-2023225679-A2 N-ISOPROPYL TRYPTAMINES AND METHOD OF MAKING MONOALKYLATED AND DIALKYLATED TRYPTAMINE ANALOGS CAAMTECH, INC. (US) 2023-11-23 WO disclosed
US-20190137872-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK DIC CORPORATION (JP) 2019-05-09 US disclosed
CN-109153653-A New compound, Photocurable composition, its solidfied material, printing ink and the printed article for having used the printing ink DIC株式会社 2019-01-04 CN disclosed
WO-2016043975-A1 CRYSTALLINE FORMS OF TYROSINE KINASE INHIBITORS AND THEIR SALTS VM PHARMA LLC (US) 2016-03-24 WO disclosed
US-7690378-B1 Methods, systems and devices for monitoring respiratory disorders PACESETTER, INC. (US) 2010-04-06 US disclosed
US-7347890-B2 Cyan ink, ink set, set of ink and reaction liquid, and image forming method CANON KABUSHIKI KAISHA (JP) 2008-03-25 US disclosed
EP-0719839-B1 Phthalocyanine compounds and optical recording media comprising them MITSUI CHEMICALS INC (JP) 2001-07-25 EP disclosed
US-5693396-A NEAR INFRARED LIGHT ABSORBERS MITSUI TOATSU CHEMICALS, INC. (JP) 1997-12-02 US disclosed
EP-0719839-A2 Phthalocyanine compounds and optical recording media comprising them MITSUI TOATSU CHEMICALS, Inc. (JP) 1996-07-03 EP disclosed
EP-0252736-A2 Process for preparing fluorine-containing carboxylic acid ester SAGAMI CHEMICAL RESEARCH CENTER (JP) 1988-01-13 EP disclosed