SCHEMBL7865371

SCHEMBL7865371

COc1cccc(OC)c1C(=O)P(C(=O)c1c(OC)cccc1OC)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.58
CA1 P00915 2/20 0.58
CA2 P00918 2/20 0.58
CA7 P43166 2/20 0.58
CA9 Q16790 2/20 0.58
CA14 Q9ULX7 2/20 0.58
TAAR1 Q96RJ0 1/20 0.45
POLB P06746 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
KMT2A Q03164 1/20 0.42
HTT P42858 1/20 0.42
CA4 P22748 1/20 0.41
GAA P10253 2/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
PPARA Q07869 1/20 0.41
FABP4 P15090 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7601305 0.87 CA12 (0.45) CA12CA1CA2CA7CA9
SCHEMBL274749 0.86 CA12 (0.58) CA12CA1CA2CA7CA9
SCHEMBL28923145 0.85 CYP3A4 (0.48) CA12CA1CA2CA7CA9
Water SCHEMBL28149429 0.84 CA12 (0.56) CA12CA1CA2CA7CA9
SCHEMBL23610603 0.84 CA12 (0.56) CA12CA1CA2CA7CA9
Benzene SCHEMBL28834320 0.79 CA12 (0.64) CA12CA1CA2CA7CA9
SCHEMBL3306485 0.77 CA12 (0.61) CA12CA1CA2CA7CA9
SCHEMBL14272588 0.77 CA12 (0.51) CA12CA1CA2CA7CA9
SCHEMBL7181102 0.76 PARP15 (0.45) KMT2A
SCHEMBL14365187 0.76 L3MBTL1 (0.41) POLBSMN1; SMN2KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4238769-A1 INK COMPOSITION DNP Fine Chemicals Co., Ltd. (JP) 2023-09-06 EP disclosed
CN-113474429-A Composition for adhesive, exterior material for electricity storage device, and method for producing same 昭和电工株式会社 2021-10-01 CN disclosed
CN-110320752-A Photosensitive polymer combination, dual liquid type photosensitive polymer combination, dry film and printed circuit board 太阳油墨制造株式会社 2019-10-11 CN disclosed
EP-1135399-A1 PROCESS FOR PREPARING ACYLPHOSPHINES AND DERIVATIVES Ciba SC Holding AG (CH) 2001-09-26 EP disclosed
WO-2000032612-A1 PROCESS FOR PREPARING ACYLPHOSPHINES AND DERIVATIVES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-06-08 WO disclosed