Monoethanolamine

Monoethanolamine

SCHEMBL7873072

C1CO1.NCCO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MPL

The experimentally established mechanism targets of Monoethanolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6242400-B1 Method of stripping resists from substrates using hydroxylamine and alkanolamine EKC TECHNOLOGY, INC. 2001-06-05 US disclosed
US-6140287-A A STRIPPING AND CLEANING AGENT COMPRISING HYDROXYLAMINE AND AT LEAST ONE ALKANOLAMINE AND WATER FOR REMOVING RESISTS AND ETCHING RESIDUE FROM THE SUBSTRATE EKC TECHNOLOGY, INC. (US) 2000-10-31 US disclosed
US-6000411-A MIXTURE OF HYDROXLYAMINE, ALKANOLAMINE AND WATER EKC TECHNOLOGY, INC. (US) 1999-12-14 US disclosed
US-5902780-A COMPRISING HYDROXYLAMINE, ABOUT 10-80% BY WEIGHT OF AN ALKANOLAMINE WHICH IS MISCIBLE WITH SAID HYDROXYLAMINE, AND WATER EKC TECHNOLOGY, INC. (US) 1999-05-11 US disclosed
US-5672577-A STRIPPER SOLUTION ALSO CONTAINS WATER, 1,2-DIHYDROXYBENZENE OR DERIVATIVES, MERCAPTOPHENOL/O-/ OR MERCAPTOBENZOIC ACID/O-/, AND ETHYLENEDIAMINETETRACARBOXYLIC ACID AS CHELATING AGENTS TO PROVIDE STABILITY AND EFFECTIVENESS EKC TECHNOLOGY, INC. (US) 1997-09-30 US disclosed
US-5381807-A Semiconductor, polymer coatings EKC TECHNOLOGY, INC. (US) 1995-01-17 US disclosed
US-5334332-A Mixture of hydroxylamine, alkanolamine and chelate compound EKC TECHNOLOGY, INC. (US) 1994-08-02 US disclosed
US-5279771-A Removal photoresist from substrate EKC TECHNOLOGY, INC. (US) 1994-01-18 US disclosed