Styrene

Styrene

SCHEMBL7873646

C=C(C)C(=O)O.C=C(C)C(=O)OCC(CC(=C)C(=O)OCCCC)OC(=O)C(=C)C.C=Cc1ccccc1

nearest known ligand 0.39

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Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.39
TDP1 Q9NUW8 4/20 0.37
POLB P06746 2/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
KDM4E B2RXH2 3/20 0.36
L3MBTL1 Q9Y468 3/20 0.33
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 1/20 0.32
MAPK1 P28482 3/20 0.32
ALDH1A1 P00352 2/20 0.32
CYP3A4 P08684 2/20 0.32
MEN1 O00255 3/20 0.31
KMT2A Q03164 3/20 0.31
HSD17B10 Q99714 1/20 0.31
TP53 P04637 1/20 0.30
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL6115186 0.88 MEN1 (0.42) TSHRTDP1POLBKDM4EL3MBTL1
Methacrylic Acid SCHEMBL7607962 0.87 TSHR (0.50) TSHRTDP1POLBAPEX1HTT
Methacrylic Acid SCHEMBL7599834 0.87 TSHR (0.50) TSHRTDP1POLBAPEX1HTT
Styrene SCHEMBL5444350 0.85 TSHR (0.53) TSHRTDP1POLBAPEX1HTT
Styrene SCHEMBL6115093 0.84 TSHR (0.35) TSHRTDP1POLBAPEX1HTT
Methacrylic Acid SCHEMBL7911912 0.84 TSHR (0.47) TSHRTDP1POLBAPEX1HTT
Styrene SCHEMBL8349037 0.84 TSHR (0.51) TSHRTDP1POLBAPEX1HTT
Styrene SCHEMBL7556826 0.84 TSHR (0.51) TSHRTDP1POLBAPEX1HTT
SCHEMBL6235107 0.84 TSHR (0.54) TSHRTDP1POLBAPEX1HTT
Styrene SCHEMBL6556236 0.83 TSHR (0.55) TSHRTDP1POLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6312858-B1 IMAGED PHOTOGRAPHIC ELEMENT COMPRISING: AT LEAST ONE IMAGED LAYER COMPRISING EITHER SILVER AND/OR THE REACTION PRODUCT OF A DEVELOPING AGENT AND A DYE-FORMING COUPLER, WHICH IMAGED LAYER IS SUPERPOSED ON A SIDE OF SAID SUPPORT EASTMAN KODAK COMPANY 2001-11-06 US disclosed
US-6214938-B1 COATING FORMULATION CONSISTS OF A FIRST WATER INSOLUBLE POLYMER CONTAINING UNSATURATED NITRILE OR FLUORIDE OR CHLORIDE CONTAINING MONOMER WITH GLASS TRANSITION TEMPERATURE LESS THAN 30 DEGREE AND SECOND POLYMER IS MICROGEL PARTICLE EASTMAN KODAK COMPANY 2001-04-10 US disclosed
US-6130014-A A BARRIER LAYER COMPRISING A WATER INSOLUBLE POLYMER SELECTED FROM A CHLOROPOLYMER, FLUOROPOLYMER OR ACRYLONITRILE POLYMER AND A MICROGEL PARTICLE; RADIATION RESISTANCE, WATERPROOFING, RESIST TO FINGERPRINTS AND SCRATCHING EASTMAN KODAK COMPANY (US) 2000-10-10 US disclosed