SCHEMBL7874161

SCHEMBL7874161

OC(Cl)=C(Cl)c1ccccc1.OC=Cc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.42
PLIN1 O60240 2/20 0.42
LMNA P02545 2/20 0.42
MAPT P10636 2/20 0.42
RECQL P46063 2/20 0.42
PLIN5 Q00G26 2/20 0.42
ABHD5 Q8WTS1 2/20 0.42
CYP1B1 Q16678 2/20 0.42
BCHE P06276 1/20 0.42
TNFRSF1A P19438 1/20 0.42
ACHE P22303 1/20 0.42
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
HDAC1 Q13547 2/20 0.38
ALDH1A1 P00352 2/20 0.38
HDAC3 O15379 1/20 0.38
TNKS O95271 1/20 0.38
HDAC4 P56524 1/20 0.38
HCAR2 Q8TDS4 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7880198 0.88 MAPT (0.39) MAOBPLIN1LMNAMAPTRECQL
SCHEMBL28759603 0.80 MAOB (0.58) MAOBPLIN1LMNAMAPTRECQL
SCHEMBL2777416 0.80
SCHEMBL7875628 0.80 TSHR (0.50) LMNAMAPTRECQLALDH1A1F3
SCHEMBL20077 0.80
SCHEMBL6555189 0.79 HDAC1 (0.54) MAOBPLIN1LMNAMAPTRECQL
Iodide SCHEMBL31264191 0.78 MAOB (0.55) MAOBPLIN1LMNAMAPTRECQL
SCHEMBL29127335 0.78 MAOB (0.55) MAOBPLIN1LMNAMAPTRECQL
Bromide SCHEMBL5434485 0.78 MAOB (0.55) MAOBPLIN1LMNAMAPTRECQL
Water SCHEMBL27501786 0.78 MAOB (0.55) MAOBPLIN1LMNAMAPTRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6319654-B1 PREPARING A CHEMICAL AMPLIFICATION PHOTORESIST; COATING ON A SUBSTRATE OF A SEMICONDUCTOR ELEMENT TO FORM PHOTORESIST FILM; EXPOSING FILM TO LIGHT; SILYLATION; DEVELOPING TO FORM PATTERN; ETCHING SUBSTRATE HYUNDAI ELECTRONICS INDUSTRIES (KR) 2001-11-20 US claimed
US-6319654-B1 PREPARING A CHEMICAL AMPLIFICATION PHOTORESIST; COATING ON A SUBSTRATE OF A SEMICONDUCTOR ELEMENT TO FORM PHOTORESIST FILM; EXPOSING FILM TO LIGHT; SILYLATION; DEVELOPING TO FORM PATTERN; ETCHING SUBSTRATE HYUNDAI ELECTRONICS INDUSTRIES (KR) 2001-11-20 US disclosed