SCHEMBL7875628

SCHEMBL7875628

OC(Cl)=C(Cl)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.50
DAO P14920 1/20 0.50
NAPRT Q6XQN6 1/20 0.50
ALDH1A1 P00352 3/20 0.48
HIF1A Q16665 2/20 0.48
CES1 P23141 5/20 0.43
CES2 O00748 4/20 0.43
SRD5A2 P31213 1/20 0.42
MAPK1 P28482 2/20 0.40
TRPA1 O75762 1/20 0.40
GSK3B P49841 1/20 0.40
ESR1 P03372 1/20 0.39
F2 P00734 2/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 2/20 0.39
BLM P54132 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
CA2 P00918 2/20 0.39
CA4 P22748 2/20 0.39
F10 P00742 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3940728 0.87 TSHR (0.56) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL3940726 0.87 TSHR (0.56) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL59763 0.81 TSHR (0.50) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL7874161 0.80 MAOB (0.42) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL18294893 0.79 ESR1 (0.50) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL16934008 0.77 ALDH1A1 (0.50) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL7644150 0.77 TSHR (0.46) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL11063680 0.77 ALDH1A1 (0.50) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL7914830 0.77 ALDH1A1 (0.50) TSHRDAONAPRTALDH1A1HIF1A
SCHEMBL2103298 0.77 TSHR (0.46) TSHRDAONAPRTALDH1A1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6319654-B1 PREPARING A CHEMICAL AMPLIFICATION PHOTORESIST; COATING ON A SUBSTRATE OF A SEMICONDUCTOR ELEMENT TO FORM PHOTORESIST FILM; EXPOSING FILM TO LIGHT; SILYLATION; DEVELOPING TO FORM PATTERN; ETCHING SUBSTRATE HYUNDAI ELECTRONICS INDUSTRIES (KR) 2001-11-20 US claimed
US-6319654-B1 PREPARING A CHEMICAL AMPLIFICATION PHOTORESIST; COATING ON A SUBSTRATE OF A SEMICONDUCTOR ELEMENT TO FORM PHOTORESIST FILM; EXPOSING FILM TO LIGHT; SILYLATION; DEVELOPING TO FORM PATTERN; ETCHING SUBSTRATE HYUNDAI ELECTRONICS INDUSTRIES (KR) 2001-11-20 US disclosed