⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2323264 | 1.00 | — | — | |
| SCHEMBL1052938 | 0.92 | — | — | |
| SCHEMBL29518441 | 0.92 | — | — | |
| SCHEMBL1052936 | 0.92 | — | — | |
| SCHEMBL1049799 | 0.89 | MAPT (0.30) | — | |
| SCHEMBL481597 | 0.89 | MAPT (0.30) | — | |
| SCHEMBL1052042 | 0.88 | KDM1A (0.31) | — | |
| SCHEMBL1052040 | 0.88 | KDM1A (0.31) | — | |
| SCHEMBL7637190 | 0.88 | — | — | |
| SCHEMBL7637193 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8884067-B2 | Phenol and cyclohexanone mixtures | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2014-11-11 | — | — | US | claimed |
| US-20130225867-A1 | Phenol and Cyclohexanone Mixtures | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2013-08-29 | — | — | US | claimed |
| WO-2012036822-A1 | PHENOL AND CYCLOHEXANONE MIXTURES | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2012-03-22 | — | — | WO | claimed |
| EP-3392259-B1 | SUBSTITUTED CYCLOPENTADIENYL COBALT COMPLEX AND METHOD FOR PRODUCTION THEREOF | TOSOH CORP (JP) | 2023-06-07 | — | — | EP | disclosed |
| CN-108473521-B | Substituted cyclopentadienyl cobalt complex and its preparing method, cobalt-containing film and its preparing method | 东曹株式会社 | 2021-03-12 | — | — | CN | disclosed |
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| US-10336782-B2 | Substituted cyclopentadienyl cobalt complex and method for production thereof, and cobalt-containing thin film and method for production thereof | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2019-07-02 | — | — | US | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| US-20180362568-A1 | SUBSTITUTED CYCLOPENTADIENYL COBALT COMPLEX AND METHOD FOR PRODUCTION THEREOF, AND COBALT-CONTAINING THIN FILM AND METHOD FOR PRODUCTION THEREOF | TOSOH CORPORATION (JP) | 2018-12-20 | — | — | US | disclosed |
| EP-3392259-A1 | SUBSTITUTED CYCLOPENTADIENYL COBALT COMPLEX AND METHOD FOR PRODUCTION THEREOF, AND COBALT-CONTAINING THIN FILM AND METHOD FOR PRODUCTION THEREOF | Tosoh Corporation (JP) | 2018-10-24 | — | — | EP | disclosed |
| WO-2018010784-A1 | PROCESS FOR THE PREPARATION OF MOLYBDENUM DISULFIDE NANOPARTICLES SUPPORTED ON TITANIA | SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) | 2018-01-18 | — | — | WO | disclosed |
| EP-2141141-A1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | Air Products and Chemicals, Inc. (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090297711-A1 | Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090291210-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-11-26 | — | — | US | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |