⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL264899 | 0.85 | — | — | |
| SCHEMBL7949788 | 0.77 | — | — | |
| SCHEMBL2490111 | 0.75 | — | — | |
| SCHEMBL13337532 | 0.75 | — | — | |
| SCHEMBL28604869 | 0.73 | — | — | |
| SCHEMBL1315167 | 0.72 | — | — | |
| SCHEMBL5690778 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL1702201 | 0.69 | — | — | |
| SCHEMBL1314883 | 0.69 | — | — | |
| SCHEMBL10718003 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 763 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111655791-B | Pest and ice phobic compositions with fluid additives | HRL实验室有限责任公司 | 2022-11-04 | — | — | CN | claimed |
| US-11072713-B2 | Bugphobic and icephobic compositions with fluid additives | HRL LABORATORIES, LLC (US) | 2021-07-27 | — | — | US | claimed |
| EP-3746509-A1 | BUGPHOBIC AND ICEPHOBIC COMPOSITIONS WITH FLUID ADDITIVES | HRL Laboratories, LLC (US) | 2020-12-09 | — | — | EP | claimed |
| CN-111655791-A | Pest and ice phobic compositions with fluid additives | HRL实验室有限责任公司 | 2020-09-11 | — | — | CN | claimed |
| WO-2019152081-A1 | BUGPHOBIC AND ICEPHOBIC COMPOSITIONS WITH FLUID ADDITIVES | HRL LABORATORIES, LLC (US) | 2019-08-08 | — | — | WO | claimed |
| US-20190023910-A1 | BUGPHOBIC AND ICEPHOBIC COMPOSITIONS WITH FLUID ADDITIVES | HRL LABORATORIES, LLC | 2019-01-24 | — | — | US | claimed |
| CN-106566855-A | Nucleic acid amplification using reversibly modified oligonucleotide | 毕万里 | 2017-04-19 | — | — | CN | claimed |
| US-20140243517-A1 | METHODS OF PRODUCING C-ARYL GLUCOSIDE SGLT2 INHIBITORS | ASTRAZENECA AB (SE) | 2014-08-28 | — | — | US | claimed |
| US-20140219903-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2014-08-07 | — | — | US | claimed |
| CN-103781937-A | Film-forming material, sealing film using same, and use of sealing film | TOSOH CORP | 2014-05-07 | — | — | CN | claimed |
| CN-1744918-A | Polymeric reagents comprising a ketone or a related functional group | NEKTAR THERAPEUTICS AL CORP (US) | 2006-03-08 | — | — | CN | claimed |
| EP-1581543-A2 | METHODS OF PRODUCING C-ARYL GLUCOSIDE SGLT2 INHIBITORS | Bristol-Myers Squibb Company (US) | 2005-10-05 | — | — | EP | claimed |
| EP-1581260-A2 | POLYMERIC REAGENTS COMPRISING A KETONE OR A RELATED FUNCTIONAL GROUP | Nektar Therapeutics Al, Corporation (US) | 2005-10-05 | — | — | EP | claimed |
| US-20040197284-A1 | Cosmetic composition comprising a volatile fatty phase | L'OREAL S.A. (FR) | 2004-10-07 | — | — | US | claimed |
| WO-2004063209-A2 | METHODS OF PRODUCING C-ARYL GLUCOSIDE SGLT2 INHIBITORS | BRISTOL-MYERS SQUIBB COMPANY (US) | 2004-07-29 | — | — | WO | claimed |
| WO-2004060406-A2 | POLYMERIC REAGENTS COMPRISING A KETONE OR A RELATED FUNCTIONAL GROUP | NEKTAR THERAPEUTICS AL, CORPORATION (US) | 2004-07-22 | — | — | WO | claimed |
| US-20040138439-A1 | inhibitors of sodium dependent glucose transporters found in the intestine and kidney (SGLT2), and more particularly to a process of producing such compounds, for example 1-C-(substituted diphenylmethane-3-yl)- beta -D-glucopyranose | ASTRAZENECA AB (SE) | 2004-07-15 | — | — | US | claimed |
| US-20030064154-A1 | Low-K dielectric thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2003015129-A2 | LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME | ADVANCED TECHNOLOGY MATERIAL, INC. (US) | 2003-02-20 | — | — | WO | claimed |
| US-20020172766-A1 | Low dielectric constant thin films and chemical vapor deposition method of making same | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-11-21 | — | — | US | claimed |