SCHEMBL7898985

SCHEMBL7898985

O=C1Cc2ccccc2CN1O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ RNASEH1 O60930 1/20 0.50
▸ CYP1A2 P05177 1/20 0.46
▸ CYP2A6 P11509 1/20 0.45
▸ NOTUM Q6P988 3/20 0.43
▸ RXFP1 Q9HBX9 1/20 0.42
▸ HPGD P15428 1/20 0.41
▸ GAA P10253 2/20 0.39
▸ PKM P14618 1/20 0.39
▸ TLR9 Q9NR96 1/20 0.39
▸ HTR7 P34969 3/20 0.38
▸ KMT2A Q03164 2/20 0.38
▸ PRMT5 O14744 1/20 0.37
▸ WDR77 Q9BQA1 1/20 0.37
▸ PER2 O15055 1/20 0.37
▸ CRY2 Q49AN0 1/20 0.37
▸ MAOA P21397 1/20 0.37
▸ MEN1 O00255 1/20 0.36
▸ HTR1A P08908 1/20 0.36
▸ ACHE P22303 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13806435 0.74 CYP1A2 (0.46) RNASEH1CYP1A2CYP2A6NOTUMRXFP1
SCHEMBL677618 0.74 BRD4 (0.50) RNASEH1CYP1A2CYP2A6NOTUMRXFP1
SCHEMBL28844401 0.71 NPC1 (0.56) CYP1A2CYP2A6RXFP1HPGDGAA
SCHEMBL13507876 0.71 CYP1A2 (0.43) RNASEH1CYP1A2CYP2A6NOTUMRXFP1
SCHEMBL23430068 0.70 CYP1A2 (0.52) RNASEH1CYP1A2CYP2A6NOTUMRXFP1
SCHEMBL13239543 0.70 CYP1A2 (0.52) RNASEH1CYP1A2CYP2A6NOTUMHPGD
SCHEMBL38662990 0.70 KDM4E (0.54) CYP1A2NOTUMKMT2APER2CRY2
SCHEMBL3195836 0.70 RNASEH1 (0.60) RNASEH1CYP1A2NOTUMHPGDHTR7
SCHEMBL4725874 0.70 KMT2A (0.63) RNASEH1GAAPKMTLR9KMT2A
SCHEMBL29836002 0.70 RNASEH1 (0.60) RNASEH1CYP1A2NOTUMHPGDHTR7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 — — US disclosed
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