⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19219828 | 0.72 | — | — | |
| SCHEMBL108 | 0.61 | — | — | |
| Bromide SCHEMBL5098611 | 0.55 | — | — | |
| SCHEMBL3929840 | 0.55 | — | — | |
| SCHEMBL84660 | 0.55 | — | — | |
| SCHEMBL23646156 | 0.55 | — | — | |
| Bromide SCHEMBL2326492 | 0.50 | — | — | |
| SCHEMBL14499198 | 0.50 | — | — | |
| SCHEMBL685180 | 0.50 | — | — | |
| SCHEMBL18815271 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11784026-B2 | Substrate processing apparatus, material layer deposition apparatus, and atmospheric pressure chemical vapor deposition apparatus | SAMSUNG ELECTRONICS CO., LTD. | 2023-10-10 | — | — | US | disclosed |
| US-20210222300-A1 | SUBSTRATE PROCESSING APPARATUS, MATERIAL LAYER DEPOSITION APPARATUS, AND ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-07-22 | — | — | US | disclosed |
| WO-2010074588-A2 | PHARMACEUTICAL COMPOUNDS | BIAL - PORTELA & Cª, S.A. (PT) | 2010-07-01 | — | — | WO | disclosed |