SCHEMBL7904547

SCHEMBL7904547

CC(C)(C)c1ccccc1[S+](c1ccccc1C(C)(C)C)c1ccccc1C(C)(C)C.CCCCCCCCCCCCc1ccccc1S(=O)(=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.42
KCNH2 Q12809 6/20 0.38
NR1H2 P55055 1/20 0.36
NR1H3 Q13133 1/20 0.36
BID P55957 3/20 0.35
MCL1 Q07820 3/20 0.35
BCL2L1 Q07817 2/20 0.35
BAK1 Q16611 2/20 0.35
KAT8 Q9H7Z6 2/20 0.35
FUT7 Q11130 1/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
EP300 Q09472 1/20 0.35
KAT2A Q92830 1/20 0.35
KAT2B Q92831 1/20 0.35
KAT5 Q92993 1/20 0.35
SAE1 Q9UBE0 1/20 0.35
THRA P10827 1/20 0.34
THRB P10828 1/20 0.34
S1PR1 P21453 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16895142 0.86 LIPG (0.54) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822174 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822091 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822107 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822101 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Potassium Ion SCHEMBL23749193 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822098 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822093 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822088 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID
Lithium Ion SCHEMBL21822090 0.85 LIPG (0.53) LIPGKCNH2NR1H2NR1H3BID

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US claimed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP claimed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO claimed
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US disclosed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP disclosed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO disclosed