SCHEMBL7904702

SCHEMBL7904702

CCC(C[SiH](Oc1ccccc1)Oc1ccccc1)OCC1CO1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.46
ALDH1A1 P00352 3/20 0.39
TP53 P04637 3/20 0.39
TSHR P16473 3/20 0.39
HIF1A Q16665 2/20 0.39
CYP3A4 P08684 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
GLA P06280 1/20 0.37
MAPT P10636 2/20 0.33
HPGD P15428 2/20 0.33
HRH3 Q9Y5N1 1/20 0.33
CYP1A2 P05177 1/20 0.33
PPARG P37231 1/20 0.33
MGLL Q99685 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL158400 0.76 ALDH1A1 (0.35) TDP1ALDH1A1TSHRSMN1; SMN2
SCHEMBL28552706 0.76 TDP1 (0.46) TDP1ALDH1A1TP53TSHRHIF1A
SCHEMBL27964267 0.76 TDP1 (0.45) TDP1ALDH1A1TP53TSHRHIF1A
SCHEMBL50213 0.75 ALDH1A1 (0.34) TDP1ALDH1A1TSHRSMN1; SMN2
SCHEMBL9188885 0.74 ALDH1A1 (0.33) TDP1ALDH1A1TSHRSMN1; SMN2
SCHEMBL28469325 0.74 TDP1 (0.44) TDP1ALDH1A1TP53TSHRHIF1A
SCHEMBL10477076 0.73 TDP1 (0.57) TDP1ALDH1A1TP53TSHRHIF1A
SCHEMBL28856019 0.73 ALDH1A1 (0.37) TDP1ALDH1A1TSHRSMN1; SMN2
SCHEMBL11682632 0.73 TDP1 (0.53) TDP1ALDH1A1TP53TSHRHIF1A
SCHEMBL4631603 0.73 SMN1; SMN2 (0.39) TDP1ALDH1A1TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN claimed
EP-4602644-A1 A METHOD OF PRODUCING SEMICONDUCTOR DEVICES COMPRISING LOW DIELECTRIC CONSTANT THIN FILMS Pibond Oy (FI) 2025-08-20 EP disclosed
WO-2025093814-A1 LITHOGRAPHY METHODS, AND ELEMENTS AND DEVICES OBTAINABLE BY THE METHODS PIBOND OY (FI) 2025-05-08 WO disclosed
WO-2025032285-A1 HIGH BREAKDOWN VOLTAGE DIELECTRIC POLYMER FILMS, A METHOD OF PRODUCING THE SAME AND USES THEREOF PIBOND OY (FI) 2025-02-13 WO disclosed
WO-2024079392-A1 A METHOD OF PRODUCING SEMICONDUCTOR DEVICES COMPRISING LOW DIELECTRIC CONSTANT THIN FILMS PIBOND OY (FI) 2024-04-18 WO disclosed
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN disclosed
EP-3931639-A1 FUNCTIONAL HYDROGEN SILSESQUIOXANE RESINS AND THE USE THEREOF Pibond Oy (FI) 2022-01-05 EP disclosed
EP-3834041-A2 SILANOL-CONTAINING ORGANIC-INORGANIC HYBRID COATINGS FOR HIGH RESOLUTION PATTERNING Pibond Oy (FI) 2021-06-16 EP disclosed
WO-2020030855-A2 SILANOL-CONTAINING ORGANIC-INORGANIC HYBRID COATINGS FOR HIGH RESOLUTION PATTERNING PIBOND OY (FI) 2020-02-13 WO disclosed
EP-0927700-B1 Method of producing anhydrous zinc antimonate NISSAN CHEMICAL IND LTD (JP) 2001-11-21 EP disclosed