Cyclohexane Propionic Acid

Cyclohexane Propionic Acid

SCHEMBL7906990

O=C(O)CCC1CCCCC1.[Ru]

nearest known ligand 0.53

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.53
LMNA P02545 1/20 0.52
KDM5A P29375 3/20 0.50
PHF8 Q9UPP1 3/20 0.50
KDM2A Q9Y2K7 3/20 0.50
KDM4C Q9H3R0 2/20 0.50
KDM4A O75164 1/20 0.50
ALDH1A1 P00352 4/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
HSD11B1 P28845 1/20 0.44
TP53 P04637 1/20 0.43
CYP2D6 P10635 1/20 0.42
EPHX1 P07099 2/20 0.42
TDP1 Q9NUW8 1/20 0.41
NPC1 O15118 1/20 0.41
NFKB1 P19838 1/20 0.41
RAB9A P51151 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane Propionic Acid SCHEMBL18344239 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
Cyclohexane Propionic Acid SCHEMBL391087 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
SCHEMBL31323847 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
SCHEMBL1595661 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
SCHEMBL9742678 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
SCHEMBL11024174 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
Cyclohexane Propionic Acid SCHEMBL28302091 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
SCHEMBL9130865 0.98 HPGD (0.55) HPGDLMNAKDM5APHF8KDM2A
Cyclohexane Propionic Acid SCHEMBL3101046 0.95 HPGD (0.53) HPGDLMNAKDM5APHF8KDM2A
Cyclohexane Propionic Acid SCHEMBL6058501 0.95 HPGD (0.53) HPGDLMNAKDM5APHF8KDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6197366-B1 ELECTROCONDUCTIVE METAL FILM FROM LOW TEMPERATURE BAKING FROMNITRATE SALT AND CYANO COMPOUND, CARBONYL COMPOUND OR ORGANIC SALT OF METAL AND AMINO TAKAMATSU RESEARCH LABORATORY (JP) 2001-03-06 US disclosed
EP-0989205-A1 METAL PASTE AND METHOD FOR PRODUCTION OF METAL FILM Takamatsu Research Laboratory (JP) 2000-03-29 EP disclosed