SCHEMBL7908352

SCHEMBL7908352

O=C(O)C1C2C=CC(C2)C1C(=O)OCCOC(=O)C1C2C=CC(C2)C1C(=O)O

nearest known ligand 0.68

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.68
POLB P06746 4/20 0.68
SMN1; SMN2 Q16637 1/20 0.68
LMNA P02545 1/20 0.57
TDP1 Q9NUW8 3/20 0.48
APEX1 P27695 1/20 0.48
TAAR1 Q96RJ0 2/20 0.45
NPSR1 Q6W5P4 1/20 0.45
HTT P42858 2/20 0.43
RAB9A P51151 2/20 0.43
NPC1 O15118 1/20 0.40
TSHR P16473 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7901420 0.95 ALDH1A1 (0.62) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL7911627 0.93 ALDH1A1 (0.64) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL7911629 0.93 ALDH1A1 (0.64) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL13897065 0.92 ALDH1A1 (0.59) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL7647029 0.91 ALDH1A1 (0.62) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL7911633 0.91 ALDH1A1 (0.62) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL5837469 0.90 POLB (0.65) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL7644514 0.88 ALDH1A1 (0.59) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL18270264 0.87 ALDH1A1 (0.55) ALDH1A1POLBSMN1; SMN2LMNATDP1
SCHEMBL14789663 0.87 ALDH1A1 (0.55) ALDH1A1POLBSMN1; SMN2LMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200731-B1 A DI(5-NORBORNENE-2-CARBOXYLIC ACID-3-CARBOXYLATE) COMPOUND FOR PREPARING A PHOTORESIST COPOLYMER AND IMPROVING THE POLYMERIZATION YIELD, REDUCE THE PRODUCTION COST HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-03-13 US claimed
US-6200731-B1 A DI(5-NORBORNENE-2-CARBOXYLIC ACID-3-CARBOXYLATE) COMPOUND FOR PREPARING A PHOTORESIST COPOLYMER AND IMPROVING THE POLYMERIZATION YIELD, REDUCE THE PRODUCTION COST HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-03-13 US disclosed
JP-2000206682-A PHOTORESIST CROSSLINKER, PHOTORESIST COPOLYMER, ITS PRODUCTION, PHOTORESIST COMPOSITION, PHOTORESIST PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE HYUNDAI ELECTRONICS IND CO LTD 2000-07-28 JP disclosed