SCHEMBL790873

SCHEMBL790873

COCn1[c]ccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL791024 0.77
SCHEMBL4927956 0.68
SCHEMBL4934757 0.67
SCHEMBL791166 0.67
SCHEMBL18245215 0.64
SCHEMBL18245299 0.62 LMNA (0.31)
SCHEMBL849669 0.62
SCHEMBL4728287 0.62
SCHEMBL5095662 0.60
SCHEMBL4473832 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2586827-B1 CURABLE RESIN COMPOSITION ADEKA CORP (JP) 2017-12-27 EP disclosed
EP-2616459-B1 PYRIDINE COMPOUNDS FOR CONTROLLING INVERTEBRATE PESTS I BASF SE (DE) 2016-05-04 EP disclosed
US-8735511-B2 Curing resin composition ADEKA CORPORATION (JP) 2014-05-27 US disclosed
US-8609700-B2 Pyridine compounds for controlling invertebrate pests I BASF SE (DE) 2013-12-17 US disclosed
EP-2616459-A1 PYRIDINE COMPOUNDS FOR CONTROLLING INVERTEBRATE PESTS I BASF SE (DE) 2013-07-24 EP disclosed
US-20130178502-A1 Pyridine Compounds for Controlling Invertebrate Pests I BASF SE (DE) 2013-07-11 US disclosed
EP-2586827-A1 CURABLE RESIN COMPOSITION Adeka Corporation (JP) 2013-05-01 EP disclosed
US-20120115972-A1 CURING RESIN COMPOSITION ADEKA CORPORATION (JP) 2012-05-10 US disclosed
WO-2012034961-A1 PYRIDINE COMPOUNDS FOR CONTROLLING INVERTEBRATE PESTS I BASF SE (DE) 2012-03-22 WO disclosed
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed