SCHEMBL7909322

SCHEMBL7909322

[CH2]CCCC[CH]F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17890384 0.97
SCHEMBL17890377 0.97
SCHEMBL4857139 0.90
SCHEMBL1104 0.78
SCHEMBL18632233 0.77
SCHEMBL20474561 0.75
SCHEMBL20474559 0.75
SCHEMBL2496645 0.73 FAAH (0.31)
SCHEMBL14686726 0.73
SCHEMBL5985842 0.73 FAAH (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023114944-A1 FLUORINATED CATIONIC LIPIDS FOR USE IN LIPID NANOPARTICLES Acuitas Therapeutics, Inc. (CA) 2023-06-22 WO claimed
WO-2024143067-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, IMAGE DISPLAY APPARATUS, AND CURED PRODUCT FORMING METHOD 三菱ケミカル株式会社 2024-07-04 WO disclosed
CN-117546088-A Photosensitive resin composition, cured product, partition wall, organic electroluminescent element, color filter, image display device, and method for forming cured product 三菱化学株式会社 2024-02-09 CN disclosed
CN-117136333-A Colored photosensitive resin composition, cured product, partition wall, color filter, and image display device 三菱化学株式会社 2023-11-28 CN disclosed
WO-2023114944-A1 FLUORINATED CATIONIC LIPIDS FOR USE IN LIPID NANOPARTICLES Acuitas Therapeutics, Inc. (CA) 2023-06-22 WO disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-25 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed
US-6201082-B1 BLOCK POLYMERIZATION OF MONOMERS WITH FLUORINE MACROAZO INITIATORS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2001-03-13 US disclosed
EP-0811605-B1 Fluorine-containing macroazo compound WAKO PURE CHEM IND LTD (JP) 2000-08-09 EP disclosed
EP-0811604-B1 Fluorine-containing azo compounds WAKO PURE CHEM IND LTD (JP) 2000-05-03 EP disclosed
US-5994486-A USEFUL AS A POLYMERIZATION INITIATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-11-30 US disclosed
US-5847091-A Fluorine-containing azo compounds WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1998-12-08 US disclosed
EP-0811605-A1 Fluorine-containing macroazo compound WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-12-10 EP disclosed
EP-0811604-A1 Fluorine-containing azo compounds WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-12-10 EP disclosed