⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20377466 | 0.83 | — | — | |
| SCHEMBL20496564 | 0.81 | — | — | |
| SCHEMBL20496532 | 0.75 | — | — | |
| SCHEMBL20377471 | 0.72 | — | — | |
| SCHEMBL8380317 | 0.70 | — | — | |
| SCHEMBL783218 | 0.68 | — | — | |
| SCHEMBL8380367 | 0.67 | — | — | |
| SCHEMBL8380951 | 0.67 | — | — | |
| SCHEMBL6850849 | 0.66 | — | — | |
| SCHEMBL722805 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | claimed |
| US-20250277305-A1 | Selective Thin Film Deposition Method Using Area-Selective Atomic Layer Deposition Method, and Substrates Having Thin Films Selectively Formed Thereon | INCHEON NATIONAL UNIVERSITY RESEARCH & BUSINESS FOUNDATION (KR) | 2025-09-04 | — | — | US | claimed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | claimed |
| US-20220189767-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2022-06-16 | — | — | US | claimed |
| US-11081337-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Versum Materials U.S., LLC (US) | 2021-08-03 | — | — | US | claimed |
| WO-2018170126-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| WO-2018170125-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-20180269057-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | claimed |
| US-20180265967-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | claimed |
| EP-0595390-B1 | Catalyst and process for (co)polymerizing alpha-olefins | ENICHEM SPA (IT) | 1998-07-15 | — | — | EP | claimed |
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | disclosed |
| US-20250277305-A1 | Selective Thin Film Deposition Method Using Area-Selective Atomic Layer Deposition Method, and Substrates Having Thin Films Selectively Formed Thereon | INCHEON NATIONAL UNIVERSITY RESEARCH & BUSINESS FOUNDATION (KR) | 2025-09-04 | — | — | US | disclosed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | disclosed |
| US-20220282367-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE | VERSUM MATERIALS US, LLC (US) | 2022-09-08 | — | — | US | disclosed |
| EP-4013906-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE | Versum Materials US, LLC (US) | 2022-06-22 | — | — | EP | disclosed |
| WO-2018170125-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | disclosed |
| WO-2018170126-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | disclosed |
| US-20180269057-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | disclosed |
| US-20180265967-A1 | Formulation for Deposition of Silicon Doped Hafnium Oxide as Ferroelectric Materials | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | US | disclosed |
| US-6197985-B1 | METALLOCENE SUPPORTS; OLEFIN POLYMERIZATION CATALYSTS | MITSUI CHEMICALS INC (JP) | 2001-03-06 | — | — | US | disclosed |