SCHEMBL7914829

SCHEMBL7914829

C=Cc1ccc(C)c(C)c1Cl

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
CYP3A4 P08684 1/20 0.31
CHRM1 P11229 1/20 0.31
ALOX15 P16050 1/20 0.31
MAOA P21397 1/20 0.31
TBXA2R P21731 1/20 0.31
ADRA1A P35348 1/20 0.31
HTR2B P41595 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9124016 0.84 ALDH1A1 (0.39) ALDH1A1
SCHEMBL29113487 0.79 CYP3A4 (0.32) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL10403432 0.78 ALDH1A1 (0.39) ALDH1A1CYP3A4
SCHEMBL57999 0.78 MAPT (0.33) ALDH1A1KDM4EMAPTMAPK1
SCHEMBL29618949 0.78 MAPT (0.33) ALDH1A1KDM4EMAPTMAPK1
SCHEMBL9712600 0.77 ALDH1A1 (0.43) ALDH1A1CYP3A4KDM4EMAPT
Ethylene SCHEMBL27864741 0.76 KDM4E (0.32) ALDH1A1KDM4EMAPTMAPK1
SCHEMBL158243 0.74 KDM4E (0.31) ALDH1A1KDM4EMAPTMAPK1
Hydrochloric Acid SCHEMBL11018653 0.74 KDM4E (0.31) ALDH1A1KDM4EMAPTMAPK1
SCHEMBL8676276 0.74 MAPT (0.39) ALDH1A1KDM4EMAPTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6255424-B1 COUPLING POLYMERIC PRECURSOR SEGMENTS, EACH HAVING LIVING END CAPABLE OF REACTING IN POLYMERIZATION REACTION, TOGETHER IN CONVERGENT MANNER INVOLVING REACTION OF MULTIFUNCTIONAL COUPLING AGENT TO FORM HYPERBRANCHED STRUCTURE COLORADO SCHOOL OF MINES 2001-07-03 US disclosed
EP-0348906-B1 HEAT-RESISTANT RESIN COMPOSITION SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-10-07 EP disclosed
EP-0206030-B1 PHOTOCURABLE COMPOSITION SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-01-02 EP disclosed
US-4994515-A Resin of styrene and unsaturated imide, high impact thermoplastic, bromine-containing reaction product, silicon resin or compound SHOWA DENKO KABUSHIKI KAISHA (JP) 1991-02-19 US disclosed
EP-0348906-A1 Heat-resistant resin composition SHOWA DENKO KABUSHIKI KAISHA (JP) 1990-01-03 EP disclosed
US-4756994-A Ethylenically unsaturated monomer, photopolymerizable monomer, polymerization inhibitor, nitrogen-containing compound SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-07-12 US disclosed
EP-0206030-A2 Photocurable composition SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-12-30 EP disclosed