SCHEMBL7915030

SCHEMBL7915030

CCc1c[nH]c(C)n1.O=C(O)c1cc(C(=O)O)cc(C(=O)O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOTUM Q6P988 1/20 0.43
DAO P14920 1/20 0.39
TPMT P51580 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
ALDH1A1 P00352 2/20 0.38
TDP1 Q9NUW8 3/20 0.37
HSP90AA1 P07900 1/20 0.37
ESR2 Q92731 1/20 0.37
ALOX15 P16050 1/20 0.37
TSHR P16473 1/20 0.37
HIF1A Q16665 1/20 0.37
HRH3 Q9Y5N1 1/20 0.35
BRD4 O60885 1/20 0.35
BRD2 P25440 1/20 0.35
CREBBP Q92793 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL15528121 0.86 NOTUM (0.31) NOTUMHCAR2
SCHEMBL152067 0.82
SCHEMBL3655249 0.81 USP2 (0.35) MEN1KMT2AALDH1A1ALOX15
Trifluoroacetic Acid SCHEMBL28185811 0.80 HRH4 (0.34) HRH3HCAR2
Bromide SCHEMBL27823644 0.80
Iodide SCHEMBL632156 0.80
Hydrochloric Acid SCHEMBL27681884 0.80
Phosphoric Acid SCHEMBL27696431 0.79 SMN1; SMN2 (0.31)
Sulfuric Acid SCHEMBL27808621 0.79 SMN1; SMN2 (0.31)
Potassium Ion SCHEMBL28189184 0.78 NOS3 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6214424-B1 APPLYING SCREEN PRINT HAVING NATURAL ICE CRYSTAL PATTERN ONTO TRANSPARENT SUBSTRATE COMPRISING FLAT TRANSPARENT SHEET, DOOR, WINDOW OR DRINKING CONTAINER; SCREEN PRINTING POLYMER COATING; CURING POLYMER COATING TO FORM TRANSLUCENT PATTERN THERMOSEAL GLASS CORPORATION 2001-04-10 US disclosed
WO-2000056469-A1 SIMULATED ICE CRYSTAL FORMATION ON SUBSTRATES THERMOSEAL GLASS CORPORATION (US) 2000-09-28 WO disclosed
EP-0428870-B1 Photosensitive resin composition for forming conductor patterns and multilayer circuit boards using same HITACHI LTD (JP) 1997-07-30 EP disclosed
US-5387493-A Fine conductor pattern HITACHI, LTD. (JP) 1995-02-07 US disclosed
EP-0428870-A2 Photosensitive resin composition for forming conductor patterns and multilayer circuit boards using same HITACHI, LTD. (JP) 1991-05-29 EP disclosed