Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BACE1 | P56817 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.48 |
| ▸ | PELI1 | Q96FA3 | 1/20 | 0.45 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.44 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.44 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | RXRA | P19793 | 1/20 | 0.38 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.38 |
| ▸ | BRD4 | O60885 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27885449 | 1.00 | BACE1 (0.56) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL1595103 | 0.98 | BACE1 (0.58) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL2863692 | 0.94 | BACE1 (0.54) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL22317285 | 0.93 | BACE1 (0.52) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL24747417 | 0.92 | HSD17B1 (0.49) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL24639580 | 0.90 | BACE1 (0.48) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL9713452 | 0.87 | BACE1 (0.46) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL24639575 | 0.86 | BACE1 (0.48) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 | |
| SCHEMBL9713026 | 0.85 | BACE1 (0.53) | BACE1PELI1HDAC8KDM4EMEN1 | |
| SCHEMBL26249128 | 0.85 | HPGD (0.43) | BACE1ALDH1A1HPGDHSD17B10BCL2L1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3904079-B1 | GAS BARRIER LAMINATE | LINTEC CORP (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| EP-4169711-A1 | OPTICAL FILM, OPTICAL FILM MANUFACTURING METHOD, TRANSPARENT CONDUCTIVE FILM, AND GAS BARRIER FILM | LINTEC CORPORATION (JP) | 2023-04-26 | — | — | EP | disclosed |
| WO-2023054528-A1 | LAMINATE | リンテック株式会社 | 2023-04-06 | — | — | WO | disclosed |
| EP-4112296-A1 | LAMINATE FOR TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, AND TRANSPARENT CONDUCTIVE FILM MANUFACTURING METHOD | LINTEC CORPORATION (JP) | 2023-01-04 | — | — | EP | disclosed |
| WO-2022203067-A1 | CURABLE RESIN COMPOSITION AND CURED RESIN LAYER USING SAME | リンテック株式会社 | 2022-09-29 | — | — | WO | disclosed |
| WO-2022203086-A1 | MULTILAYER BODY | リンテック株式会社 | 2022-09-29 | — | — | WO | disclosed |
| WO-2022203071-A1 | CURABLE RESIN COMPOSITION AND CURED RESIN LAYER USING SAME | リンテック株式会社 | 2022-09-29 | — | — | WO | disclosed |
| WO-2022176571-A1 | RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR REFINING RESIN | 三菱瓦斯化学株式会社 | 2022-08-25 | — | — | WO | disclosed |
| EP-2620278-A1 | GAS-BARRIER FILM, PROCESS FOR PRODUCING SAME, MEMBER FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | LINTEC Corporation (JP) | 2013-07-31 | — | — | EP | disclosed |
| US-6217995-B1 | TRANSPARENT POLYCARBONATE OR POLYESTERCARABONATE CONTAINING CYCLIC ALIPHATIC GROUP, HAVING A VISIBLE LIGHT TRANSMITTANCE MORE THAN 80% AND A GLASS TRANSITION TEMPERATURE LESS THAN 80 DEGREE C. EXHIBIT BIREFRINGENCE INDEX LESS THAN 15 NM | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-04-17 | — | — | US | disclosed |
| US-5585212-A | LAYER HAVING BLEND OF HIGHER AND LOWER MOLECULAR WEIGHT POLYCARBONATES WITH CHARGE GENERATING AND CHARGE TRANSPORTING MATERIALS, SENSITIVITY, DURABILITY, STRENGTH, EASE OF MANUFACTURE | MINOLTA CO., LTD. (JP) | 1996-12-17 | — | — | US | disclosed |
| EP-0411192-B1 | Electrophotographic photoreceptor | IDEMITSU KOSAN CO (JP) | 1995-06-07 | — | — | EP | disclosed |
| EP-0277627-B1 | POLYFORMAL RESINS AND PROCESS FOR PRODUCING SAID RESINS | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1991-10-23 | — | — | EP | disclosed |
| EP-0411192-A1 | Electrophotographic photoreceptor | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1991-02-06 | — | — | EP | disclosed |
| US-4985326-A | PHOTOSENSITIVE LAYER CONTAINING A POLYCARBONATE AS BINDER RESIN | IDEMITSU KOSAN CO., LTD. (JP) | 1991-01-15 | — | — | US | disclosed |
| EP-0329991-A1 | Aromatic polycarbonate film | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1989-08-30 | — | — | EP | disclosed |
| US-4801679-A | Polyformal resin and process for producing said resin | IDEMITSU KOSAN CO., LTD. (JP) | 1989-01-31 | — | — | US | disclosed |
| EP-0277627-A1 | Polyformal resins and process for producing said resins | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1988-08-10 | — | — | EP | disclosed |