SCHEMBL7918693

SCHEMBL7918693

CC(=O)C1C(=O)C=Cc2ccccc21

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.42
KDM4E B2RXH2 7/20 0.38
ALDH1A1 P00352 6/20 0.38
POLB P06746 2/20 0.38
BRD4 O60885 1/20 0.38
CCL2 P13500 1/20 0.38
HTR2A P28223 2/20 0.37
MAPT P10636 6/20 0.36
HPGD P15428 5/20 0.36
MEN1 O00255 5/20 0.36
KMT2A Q03164 5/20 0.36
USP2 O75604 2/20 0.36
ALOX15 P16050 2/20 0.36
CASP1 P29466 2/20 0.36
CASP7 P55210 2/20 0.36
CYP3A4 P08684 2/20 0.35
CYP2C9 P11712 2/20 0.35
CYP2C19 P33261 2/20 0.35
CYP1A2 P05177 1/20 0.35
P2RX4 Q99571 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30148740 1.00 CYP2D6 (0.42) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL129881 0.83 CYP2D6 (0.44) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL31379445 0.83 CYP2D6 (0.44) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL22418385 0.81 ATM (0.46) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL27956295 0.81 KDM4E (0.42) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL9324773 0.80 CYP2D6 (0.41) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL7905021 0.79 MAPT (0.49) CYP2D6KDM4EALDH1A1POLBHTR2A
SCHEMBL28811725 0.78 MEN1 (0.53) CYP2D6KDM4EALDH1A1POLBHTR2A
SCHEMBL11366330 0.77 CYP2D6 (0.40) CYP2D6KDM4EALDH1A1POLBBRD4
SCHEMBL27594931 0.77 ALDH1A1 (0.42) CYP2D6KDM4EALDH1A1POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102643161-B Benzofluorene compound and uses thereof TOSOH CORPORATION (JP) 2015-10-14 CN disclosed
CN-101421226-B Benzofluorene compound and use thereof TOSOH CORP 2013-05-22 CN disclosed
CN-102643161-A Benzofluorene compound and use thereof TOSOH CORP 2012-08-22 CN disclosed
CN-102459149-A Amine derivative and organic electroluminescent device TOSOH CORP 2012-05-16 CN disclosed
CN-101421226-A Benzofluorene compound and use thereof TOSOH CORP (JP) 2009-04-29 CN disclosed
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0261890-A2 Radiation curable polymers W.R. Grace & Co.-Conn. (US) 1988-03-30 EP disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed
US-4086373-A Protective polymeric coating for glass substrate OWENS-ILLINOIS, INC. (US) 1978-04-25 US disclosed