SCHEMBL7918810

SCHEMBL7918810

CCCOCC1CC=CCC1C

nearest known ligand 0.43

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23181324 0.89 SMN1; SMN2 (0.44) SMN1; SMN2
SCHEMBL5751079 0.85 ALDH1A1 (0.47) SMN1; SMN2
SCHEMBL15129678 0.76
SCHEMBL17929730 0.74 SMN1; SMN2 (0.34) SMN1; SMN2
SCHEMBL7926832 0.73 ALDH1A1 (0.41)
Hydrochloric Acid SCHEMBL1715253 0.71
SCHEMBL14690060 0.71
SCHEMBL27384212 0.68 SMN1; SMN2 (0.31) SMN1; SMN2
SCHEMBL28225907 0.67
SCHEMBL13179103 0.67 SMN1; SMN2 (0.40) SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6235808-B1 Radiation-curable cycloaliphatic epoxy compounds, uses thereof, and compositions containing them RENSSELAER POLYTECHNIC INSTITUTE 2001-05-22 US disclosed
US-6075155-A PHOTOPOLYMERIZABLE MONOMERS; SOLVENT-FREE RENSSELAER POLYTECHNIC INSTITUTE (US) 2000-06-13 US disclosed