SCHEMBL7922206

SCHEMBL7922206

c1ccc(P(c2ccccc2)C2(P(c3ccccc3)C3(P(c4ccccc4)c4ccccc4)CCC3)CCC2)cc1

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15660290 0.93 CYP3A4 (0.35) CYP3A4TDP1
SCHEMBL1559552 0.88 CYP3A4 (0.41) CYP3A4TDP1
SCHEMBL1559842 0.83 CYP3A4 (0.41) CYP3A4TDP1
SCHEMBL1559812 0.81 CYP3A4 (0.39) CYP3A4TDP1
SCHEMBL1559970 0.78 CYP3A4 (0.45) CYP3A4TDP1
SCHEMBL15657900 0.77 HDAC4 (0.36) CYP3A4TDP1
SCHEMBL15658981 0.69 CYP3A4 (0.41) CYP3A4TDP1
SCHEMBL10339266 0.67 OPRL1 (0.40) CYP3A4TDP1
SCHEMBL5694566 0.65 HTR2A (0.48) CYP3A4TDP1
SCHEMBL7060523 0.65 CYP3A4 (0.38) CYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6242629-B1 CHARGING A REACTOR WITH CONTACT MASS CONTAINING METALLIC SILICON POWDER AND COPPER CATALYST; INTRODUCING ORGANOHALIDE-CONTAINING GAS INTO REACTOR TO EFFECT REACTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-06-05 US claimed
US-6242629-B1 CHARGING A REACTOR WITH CONTACT MASS CONTAINING METALLIC SILICON POWDER AND COPPER CATALYST; INTRODUCING ORGANOHALIDE-CONTAINING GAS INTO REACTOR TO EFFECT REACTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-06-05 US disclosed
US-6215012-B1 REACTING SILICON POWDER WITH ORGANOHALIDE GAS IN PRESENCE OF COPPER CATALYST AND METAL ORGANOPHOSPHINE COMPLEX; HALOGENATION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-04-10 US disclosed