SCHEMBL7922554

SCHEMBL7922554

C=CCOC(=O)C(=O)C(C)C

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.44
TSHR P16473 5/20 0.40
CYP3A4 P08684 2/20 0.38
MAPT P10636 3/20 0.36
CACNA1B Q00975 1/20 0.36
APBA1 Q02410 1/20 0.36
ALDH1A1 P00352 2/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
MAPK1 P28482 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
PTP4A3 O75365 2/20 0.31
PTP4A1 Q93096 2/20 0.31
PTP4A2 Q12974 1/20 0.31
CYP2C9 P11712 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3865151 0.83 TDP1 (0.42) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL29220272 0.83 TDP1 (0.44) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL5428036 0.83 TDP1 (0.44) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL5058288 0.81 TDP1 (0.43) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL536216 0.79
SCHEMBL177943 0.78 CYP3A4 (0.48) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL15567757 0.77 TDP1 (0.47) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL4953911 0.77 TSHR (0.55) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL20913015 0.76 TSHR (0.40) TDP1TSHRCYP3A4MAPTCACNA1B
SCHEMBL13671460 0.76 TDP1 (0.40) TDP1TSHRCYP3A4MAPTCACNA1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6270939-B1 STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-08-07 US claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP claimed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP claimed
US-6270939-B1 STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-08-07 US disclosed
US-6228554-B1 BLEND OF ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE COMPOUND JSR CORPORATION (JP) 2001-05-08 US disclosed
US-6020104-A SOLVENT FOR BOTH ALKALI SOLUBLE RESIN AND PHOTOSENSITVE COMPOUND; STORAGE STABILITY JSR CORPORATION (JP) 2000-02-01 US disclosed
US-5925492-A STORAGE STABLE RESIN FOR PHOTORESISTS AND INTEGRATED CIRCUITS JSR CORPORATION (JP) 1999-07-20 US disclosed
US-5494784-A COATING WAFER WITH RADIATION SENSITIVE SOLUTION OF ALKALI SOLUBLE RESIN AND 1,2-QUINONEDIAZIDE COMPOUND IN OXYCARBOXYLIC ACID ESTER SOLVENT, PREBAKING, APPLYING RADIATION THROUGH MASK, DEVELOPING PATTERN JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-02-27 US disclosed
US-5405720-A A photoresists solution for integrated circuits comprising a novolak resin and photosensitive color materials JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-04-11 US disclosed
US-5238774-A Photoresists, integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US disclosed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP disclosed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP disclosed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP disclosed