SCHEMBL7929157

SCHEMBL7929157

Oc1ccc(-c2ccc(-c3ccccc3)cc2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 1.00
BCL2L1 Q07817 1/20 1.00
ESR1 P03372 6/20 0.73
ESR2 Q92731 5/20 0.73
MEN1 O00255 4/20 0.68
KMT2A Q03164 4/20 0.68
CA12 O43570 1/20 0.62
CA1 P00915 1/20 0.62
CA2 P00918 1/20 0.62
GLA P06280 1/20 0.62
CA3 P07451 1/20 0.62
CA4 P22748 1/20 0.62
CA9 Q16790 1/20 0.62
TDP1 Q9NUW8 1/20 0.62
CA14 Q9ULX7 1/20 0.62
HSD17B1 P14061 1/20 0.62
HSD17B2 P37059 1/20 0.62
LMNA P02545 1/20 0.61
MAPT P10636 1/20 0.61
RAB9A P51151 1/20 0.61

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL38273 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL11645258 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL4236248 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
Biphenyl SCHEMBL9955402 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL7865208 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
Benzene SCHEMBL28859268 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL6739972 1.00 MMP3 (1.00) MMP3BCL2L1ESR1ESR2MEN1
Methane SCHEMBL457857 0.97 MMP3 (0.94) MMP3BCL2L1ESR1ESR2MEN1
SCHEMBL4871623 0.97 MMP3 (0.94) MMP3BCL2L1ESR1ESR2MEN1
Hydrogen Sulfide SCHEMBL20873713 0.97 MMP3 (0.94) MMP3BCL2L1ESR1ESR2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117285700-A Modification method and application of gas-phase post-amination super-crosslinked polymer 安徽建筑大学 2023-12-26 CN claimed
CN-104379545-B The manufacture method of 4,4 \"-dihydroxy-meta-terphenyl class 本州化学工业株式会社 2016-08-24 CN claimed
CN-102666518-B The manufacture method of glycidyl etherified compound and the glycidyl etherified compound of monoallyl list SHOWA DENKO KABUSHIKI KAISHA (JP) 2015-10-21 CN claimed
WO-2014186279-A1 COMPOSITES AND EPOXY RESINS BASED ON ARYL SUBSTITUTED COMPOUNDS MOMENTIVE SPECIALTY CHEM INC (US) 2014-11-20 WO claimed
US-20140336339-A1 COMPOSITES AND EPOXY RESINS BASED ON ARYL SUBSTITUTED COMPOUNDS MOMENTIVE SPECIALTY CHEMICALS INC. (US) 2014-11-13 US claimed
CN-101179112-B Organic light emitting diode including organic layer comprising organic metal complex SAMSUNG SDI CO LTD 2010-12-15 CN claimed
CN-101179112-A Organic light emitting diode including organic layer comprising organic metal complex SAMSUNG SDI CO LTD (KR) 2008-05-14 CN claimed
JP-6136088-A None JP disclosed
JP-5331320-A None JP disclosed
JP-4093322-A None JP disclosed
JP-4323253-A None JP disclosed
JP-4222858-A None JP disclosed
JP-5117360-A None JP disclosed
JP-H0493322-A PRODUCTION OF ALIPHATIC POLYESTER SEKISUI CHEM CO LTD 1992-03-26 JP disclosed
JP-H03131622-A RESIN FOR VIBRATION DAMPER SEKISUI CHEM CO LTD 1991-06-05 JP disclosed
JP-H03115325-A THIN PLATE MOLDING OF POLYESTER ELASTOMER SEKISUI CHEM CO LTD 1991-05-16 JP disclosed
JP-H03115337-A ELASTOMER COMPOSITION SEKISUI CHEM CO LTD 1991-05-16 JP disclosed
EP-0420619-A2 Engineering plastic composition and articles made of the same SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-04-03 EP disclosed
US-4906402-A Liquid crystal material IMPERIAL CHEMICAL INDUSTRIES, PLC (GB) 1990-03-06 US disclosed
EP-0259995-A1 Liquid crystal material IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1988-03-16 EP disclosed