⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4120556 | 0.69 | — | — | |
| SCHEMBL438352 | 0.69 | — | — | |
| SCHEMBL442304 | 0.67 | — | — | |
| SCHEMBL5426710 | 0.67 | — | — | |
| SCHEMBL1808061 | 0.67 | — | — | |
| SCHEMBL21295523 | 0.67 | — | — | |
| SCHEMBL8089489 | 0.67 | — | — | |
| SCHEMBL874045 | 0.67 | — | — | |
| SCHEMBL815537 | 0.65 | — | — | |
| SCHEMBL5855754 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6245482-B1 | HOMO- OR COPOLYMER CONTAINING BIS(TRIMETHYLSILYL)-2-PROPYL (METH)ACRYLATE UNITS; EXCIMER LASER PHOTOLITHOGRAPHY, DRY ETCHING RESISTANCE FOR A SHARP PHOTORESIST PATTERN AT HIGH ASPECT RATIO | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-06-12 | — | — | US | disclosed |
| US-6051362-A | Silicon containing polymer and chemically amplified resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-04-18 | — | — | US | disclosed |