SCHEMBL442304

SCHEMBL442304

C[Si](C)(C)CCC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29109056 0.97
SCHEMBL9815990 0.81
SCHEMBL16835602 0.80 ALDH1A1 (0.42)
SCHEMBL28362162 0.79 HIF1A (0.47)
SCHEMBL10787403 0.77 TSHR (0.52)
SCHEMBL27055257 0.77 TSHR (0.52)
SCHEMBL12354498 0.77 TSHR (0.52)
SCHEMBL5665688 0.75
SCHEMBL3799682 0.75
SCHEMBL25191238 0.73 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115557984-A Synthetic method of 3-trimethylsilyl propiolic aldehyde 上海易恩化学技术有限公司 2023-01-03 CN claimed
CN-102947378-A Clarified polypropylene articles with improved optical properties and/or increased temperature of crystallization BASF SE 2013-02-27 CN claimed
US-6194579-B1 PROVIDING QUANTITY OF 7-KETO CAMPTOTHECIN; SELECTIVELY SUBSTITUTING LEAVING GROUP AT C7 CARBON OF 7-KETO CAMPTOTHECIN; SELECTIVELY DERIVATIZING C7 CARBON BIONUMERIK PHARMACEUTICALS, INC. 2001-02-27 US claimed
US-5158854-A Ladder polymers having hydrophilic groups NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1992-10-27 US claimed
EP-0109617-B2 POSITIVE TYPE, RADIATION-SENSITIVE ORGANIC POLYMER MATERIALS HITACHI, LTD. (JP) 1991-09-25 EP claimed
EP-0232167-B1 PHOTOSENSITIVE AND HIGH ENERGY BEAM SENSITIVE RESIN COMPOSITION CONTAINING SUBSTITUTED POLYSILOXANE NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1988-12-28 EP claimed
EP-0232167-A2 Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) 1987-08-12 EP claimed
EP-0109617-B1 POSITIVE TYPE, RADIATION-SENSITIVE ORGANIC POLYMER MATERIALS HITACHI, LTD. (JP) 1986-04-02 EP claimed
US-4504646-A SILICON-CONTAINING ACETAL RESIN HITACHI, LTD. (JP) 1985-03-12 US claimed
EP-0109617-A1 Positive type, radiation-sensitive organic polymer materials HITACHI, LTD. (JP) 1984-05-30 EP claimed
JP-60017444-A None JP disclosed
JP-59088737-A None JP disclosed
EP-4608553-A1 HETEROGENEOUS CATALYSTS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-09-03 EP disclosed
CN-120192307-A Compounds targeting p53 mutations 上海齐鲁制药研究中心有限公司 2025-06-24 CN disclosed
CN-120152789-A Heterogeneous catalyst 陶氏环球技术有限责任公司 2025-06-13 CN disclosed
EP-0109617-A1 Positive type, radiation-sensitive organic polymer materials HITACHI, LTD. (JP) 1984-05-30 EP disclosed
JP-S5988737-A RADIATION SENSITIVE ORGANIC HIGH POLYMER MATERIAL HITACHI LTD 1984-05-22 JP disclosed
US-4424392-A HYDROFORMYLATION OF UNSATURATED SILANE, COUPLERS UNION CARBIDE CORPORATION (US) 1984-01-03 US disclosed
EP-0089690-A1 Aldehyde containing hydrolyzable silanes UNION CARBIDE CORPORATION (US) 1983-09-28 EP disclosed
JP-S05988737-A 0001-01-01 JP disclosed