Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3128037 | 0.70 | — | — | |
| SCHEMBL2309 | 0.70 | — | — | |
| SCHEMBL28282591 | 0.69 | — | — | |
| SCHEMBL14488948 | 0.69 | — | — | |
| SCHEMBL17960005 | 0.67 | — | — | |
| Isopropyl Alcohol SCHEMBL1270879 | 0.63 | — | — | |
| Isopropyl Alcohol SCHEMBL7979901 | 0.63 | ALDH1A1 (0.86) | ALDH1A1LMNA | |
| SCHEMBL22162 | 0.63 | — | — | |
| SCHEMBL183038 | 0.63 | — | — | |
| SCHEMBL124683 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6245482-B1 | HOMO- OR COPOLYMER CONTAINING BIS(TRIMETHYLSILYL)-2-PROPYL (METH)ACRYLATE UNITS; EXCIMER LASER PHOTOLITHOGRAPHY, DRY ETCHING RESISTANCE FOR A SHARP PHOTORESIST PATTERN AT HIGH ASPECT RATIO | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-06-12 | — | — | US | disclosed |
| US-6051362-A | Silicon containing polymer and chemically amplified resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-04-18 | — | — | US | disclosed |
| US-5998557-A | Chemically amplified resists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 1999-12-07 | — | — | US | disclosed |