SCHEMBL7938539

SCHEMBL7938539

C[Si](C)(C)C1=CCC([Zr+2])=C1.[H-].[H-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29104896 0.71
SCHEMBL29104894 0.71
SCHEMBL7938540 0.71
SCHEMBL5087586 0.70
Hydrochloric Acid SCHEMBL16648534 0.67
Hydrochloric Acid SCHEMBL215937 0.62
SCHEMBL6854906 0.62
Hydrochloric Acid SCHEMBL219422 0.62
Hydrochloric Acid SCHEMBL219421 0.62
Hydrochloric Acid SCHEMBL2117275 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
CN-113383273-A Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2021-09-10 CN disclosed
CN-113168093-A Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2021-07-23 CN disclosed
CN-1302022-C Matrix for producing poly olefine and method ROHM & HAAS (US) 2007-02-28 CN disclosed
CN-1339508-A Matrix for producing poly olefine and method ROHM & HAAS (US) 2002-03-13 CN disclosed
US-6245706-B1 GROUP-4 METALLOCENE STABILIZED WITH AN ANIONIC POLYNUCLEAR BORON COMPOUND FOR IMPROVED POLYMER MOLECULAR WEIGHT CONTROL AND NARROW MOLECULAR WEIGHT DISTRIBUTION EXXON CHEMICAL PATENTS, INC. 2001-06-12 US disclosed