SCHEMBL7940115

SCHEMBL7940115

C=CC(=O)OCC(CO)Oc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.53
TSHR P16473 4/20 0.42
PPARG P37231 5/20 0.36
PPARA Q07869 5/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
PKM P14618 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
MTNR1A P48039 1/20 0.35
MTNR1B P49286 1/20 0.35
TGM2 P21980 1/20 0.35
ALDH1A1 P00352 2/20 0.34
CYP3A4 P08684 2/20 0.34
TP53 P04637 1/20 0.34
MAPK1 P28482 1/20 0.34
HIF1A Q16665 1/20 0.34
AKT1 P31749 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28859164 0.87 THRB (0.51) THRBTSHRPPARGPPARACYP1A2
SCHEMBL12903943 0.87 THRB (0.59) THRBTSHRPPARGPPARASMN1; SMN2
SCHEMBL28859172 0.84 THRB (0.49) THRBTSHRPPARGPPARASMN1; SMN2
SCHEMBL21954071 0.83 THRB (0.51) THRBTSHRPPARGPPARAALDH1A1
SCHEMBL28450602 0.83 THRB (0.57) THRBTSHRPPARGPPARAMTNR1A
SCHEMBL28531263 0.82 TSHR (0.52) THRBTSHRPPARGPPARAALDH1A1
SCHEMBL181503 0.81 THRB (0.55) THRBTSHRPPARGPPARAMTNR1A
SCHEMBL4340028 0.80 THRB (0.54) THRBTSHRPPARGPPARASMN1; SMN2
SCHEMBL11027850 0.80 THRB (0.54) THRBTSHRPPARGPPARASMN1; SMN2
SCHEMBL10795122 0.80 THRB (0.54) THRBTSHRPPARGPPARASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023176172-A1 POLYIMIDE RESIN PRECURSOR 東京応化工業株式会社 2023-09-21 WO disclosed
US-6197226-B1 COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY (JP) 2001-03-06 US disclosed