SCHEMBL79453

SCHEMBL79453

CC[Si](C)(C)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL21381308 0.88 ALDH1A1 (0.36)
Benzene SCHEMBL28224181 0.84 ALDH1A1 (0.33)
SCHEMBL301942 0.80
SCHEMBL1459052 0.76
SCHEMBL11654982 0.76 ALDH1A1 (0.42)
SCHEMBL17802508 0.76 ALDH1A1 (0.42)
SCHEMBL49561 0.74
SCHEMBL3678974 0.73 ALDH1A1 (0.39)
SCHEMBL31492348 0.73
SCHEMBL7641773 0.73 ALDH1A1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1597 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120041084-A Organosilicon coating and preparation method and application thereof 广东美的制冷设备有限公司 2025-05-27 CN claimed
CN-119639002-A Modified branched organic silicon emulsifier and preparation method and application thereof 万华化学集团股份有限公司 2025-03-18 CN claimed
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US claimed
US-20250062109-A1 SURFACE-MODIFIED ELECTROSPRAY NEEDLE FOR USE IN MASS SPECTROMETRY ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA 2025-02-20 US claimed
CN-118620260-B Polypropylene capacitor film and preparation method thereof 扬州博恒新能源材料科技有限公司 2025-01-21 CN claimed
US-20240318001-A1 Thick Film Low Refractive Index Polysiloxane Claddings OPTITUNE OY (FI) 2024-09-26 US claimed
CN-118620260-A Polypropylene capacitor film and preparation method thereof 扬州博恒新能源材料科技有限公司 2024-09-10 CN claimed
US-20240218013-A1 Process for the preparation of B-[(7alpha,17beta)-17-hydroxy-7-[9-[(4,4,5,5,5-pentafluoropentyl) sulfinyl]nonyl]estra-1,3,5(10)-trien-3-yl]-boronic acid and intermediates of said process INDUSTRIALE CHIMICA S.R.L. (IT) 2024-07-04 US claimed
CN-118047945-B High-viscosity aromatic polyamide copolymerization stock solution and preparation method and application thereof 烟台泰和新材高分子新材料研究院有限公司 2024-06-25 CN claimed
EP-4370588-A1 THICK FILM LOW REFRACTIVE INDEX POLYSILOXANE CLADDINGS Optitune Oy (FI) 2024-05-22 EP claimed
EP-0954543-A1 NOVEL PROCESS FOR DECOMPOSING SILOXANE BOND-CONTAINING COMPOUND Yang, Jae-kun (KR) 1999-11-10 EP claimed
US-5958363-A Method for making monolithic metal oxide aerogels THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1999-09-28 US claimed
US-5892087-A Process for decomposing siloxane bond-containing compound Yang, Jae-Kun (KR) 1999-04-06 US claimed
WO-1998031726-A1 NOVEL PROCESS FOR DECOMPOSING SILOXANE BOND-CONTAINING COMPOUND YANG JAE KUN (KR) 1998-07-23 WO claimed
US-5654459-A VIA COMPROPORTIONATION OF ALKYLCHLOROSILANES WITH HYDROGENCHLOROSILANES IN THE PRESENCE OF A ZIRCONIUM AND/OR ALUMINUM CATALYST SATURATED WITH A HYDROGEN HALIDE; HIGH YIELD AND PURITY HUELS AKTIENGESELLSCHAFT (DE) 1997-08-05 US claimed
EP-0215069-B1 POLYSILOXANE RESIST FOR ION BEAM AND ELECTRON BEAM LITHOGRAPHY Hughes Aircraft Company (US) 1991-04-10 EP claimed
US-4981778-A POLYSESQUISILOXANE HUGHES AIRCRAFT COMPANY (US) 1991-01-01 US claimed
EP-0224723-B1 PROCESS FOR THE PREPARATION OF BETA-HYDROXYETHYL-AZOLE DERIVATIVES BAYER AG (DE) 1989-11-23 EP claimed
EP-0215069-A1 POLYSILOXANE RESIST FOR ION BEAM AND ELECTRON BEAM LITHOGRAPHY. HUGHES AIRCRAFT CO (US) 1987-03-25 EP claimed
WO-1986005284-A1 POLYSILOXANE RESIST FOR ION BEAM AND ELECTRON BEAM LITHOGRAPHY HUGHES AIRCRAFT COMPANY (US) 1986-09-12 WO claimed