SCHEMBL7948122

SCHEMBL7948122

C=CN1CCC(C)C(C(=O)OC(C)(C)C)C1=O

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.41
HRH3 Q9Y5N1 1/20 0.33
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
CASP3 P42574 1/20 0.31
DDB1 Q16531 1/20 0.31
CRBN Q96SW2 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL645180 0.82 MAPK1 (0.34) MAPK1HRH3CHRM2CHRM1CHRM3
SCHEMBL7944954 0.82 MAPK1 (0.34) MAPK1DDB1CRBN
SCHEMBL7948117 0.73 MAPK1 (0.35) MAPK1
SCHEMBL7947212 0.71 MAPK1 (0.34) MAPK1
SCHEMBL27483385 0.70 MAPK1 (0.36) MAPK1HRH3
SCHEMBL26663735 0.69 PDE4A (0.42) MAPK1CHRM2CHRM1CHRM3DDB1
SCHEMBL11014967 0.68 MAPK1 (0.50) MAPK1HRH3CHRM2CHRM1CHRM3
SCHEMBL19419779 0.67 CHRM2 (0.36) CHRM2CHRM1CHRM3
SCHEMBL14861153 0.64
SCHEMBL7082100 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1120185-C Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 2003-09-03 CN claimed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US claimed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US claimed
CN-1120185-C Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 2003-09-03 CN disclosed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US disclosed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US disclosed
US-5955606-A PHOTORESISTS OF POLYVINYLLACTAMS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1999-09-21 US disclosed
CN-1185449-A Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 1998-06-24 CN disclosed
US-5750680-A BLOCKED AT 3-POSITION; FOR USE IN MICROLITHOGRAPHY OF SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1998-05-12 US disclosed
CN-1153775-A Novel N-vinyllactam derivatives and polymers thereof HYUNDAI ELECTRONICS IND (KR) 1997-07-09 CN disclosed