SCHEMBL7947212

SCHEMBL7947212

C=CN1CC(CCCC)C(C(=O)OC(C)(C)C)C1=O

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.34
ALDH1A1 P00352 1/20 0.34
POLB P06746 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ELANE P08246 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7948117 0.93 MAPK1 (0.35) MAPK1ALDH1A1ELANE
SCHEMBL7944954 0.81 MAPK1 (0.34) MAPK1ALDH1A1ELANE
SCHEMBL7944951 0.79
SCHEMBL28724555 0.73 NFKB1 (0.32) ALDH1A1ELANE
SCHEMBL7948122 0.71 MAPK1 (0.41) MAPK1
SCHEMBL27463242 0.71 ELANE (0.33) ALDH1A1ELANE
SCHEMBL8557989 0.66 GNAI3 (0.31) ALDH1A1POLBL3MBTL1ELANE
SCHEMBL7938526 0.66 ALDH1A1 (0.32) ALDH1A1POLBL3MBTL1
SCHEMBL6569044 0.66 BRD4 (0.38) ALDH1A1ELANE
SCHEMBL645180 0.65 MAPK1 (0.34) MAPK1ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1120185-C Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 2003-09-03 CN claimed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US claimed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US claimed
CN-1120185-C Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 2003-09-03 CN disclosed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US disclosed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US disclosed
US-5955606-A PHOTORESISTS OF POLYVINYLLACTAMS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1999-09-21 US disclosed
CN-1185449-A Copolymer containing N-vinyl lactam derivative, preparation method thereof and photoresist HYUNDAI ELECTRONICAL IND CO LT (KR) 1998-06-24 CN disclosed
US-5750680-A BLOCKED AT 3-POSITION; FOR USE IN MICROLITHOGRAPHY OF SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1998-05-12 US disclosed
CN-1153775-A Novel N-vinyllactam derivatives and polymers thereof HYUNDAI ELECTRONICS IND (KR) 1997-07-09 CN disclosed