SCHEMBL7949952

SCHEMBL7949952

C=CC1CCC(OC2CCCO2)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7947219 0.95
SCHEMBL7938464 0.79
SCHEMBL16411045 0.78 OSBP (0.33)
SCHEMBL5006951 0.76
SCHEMBL5006952 0.76
Butadiene SCHEMBL616290 0.76
SCHEMBL9785228 0.73 OSBP (0.33)
SCHEMBL79345 0.72 NOS2 (0.33)
SCHEMBL2330280 0.71 OSBP (0.32)
SCHEMBL1892052 0.71 TSHR (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US claimed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US disclosed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US disclosed
US-5955606-A PHOTORESISTS OF POLYVINYLLACTAMS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1999-09-21 US disclosed
US-5750680-A BLOCKED AT 3-POSITION; FOR USE IN MICROLITHOGRAPHY OF SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1998-05-12 US disclosed