Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1B1 | P15121 | 1/20 | 0.46 |
| ▸ | CES2 | O00748 | 2/20 | 0.45 |
| ▸ | CES1 | P23141 | 2/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | CCR2 | P41597 | 3/20 | 0.41 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | PPME1 | Q9Y570 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA3 | P07451 | 1/20 | 0.39 |
| ▸ | CA6 | P23280 | 1/20 | 0.39 |
| ▸ | CA5A | P35218 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | PKLR | P30613 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8922368 | 0.98 | AKR1B1 (0.45) | AKR1B1CES2CES1POLBCCR2 | |
| SCHEMBL16341205 | 0.98 | AKR1B1 (0.45) | AKR1B1CES2CES1POLBCCR2 | |
| SCHEMBL6115457 | 0.98 | AKR1B1 (0.45) | AKR1B1CES2CES1POLBCCR2 | |
| SCHEMBL16341240 | 0.98 | AKR1B1 (0.45) | AKR1B1CES2CES1POLBCCR2 | |
| Iodobenzene SCHEMBL28113125 | 0.86 | TET2 (0.43) | AKR1B1TET2KCNH2PPME1ALDH1A1 | |
| SCHEMBL10590409 | 0.84 | PARP1 (0.41) | AKR1B1CES2CES1TET2CA3 | |
| SCHEMBL19519153 | 0.83 | AKR1B1 (0.45) | AKR1B1CES2CES1POLBCCR2 | |
| SCHEMBL3195282 | 0.82 | PKM (0.47) | CES2CES1POLBTET2CA3 | |
| SCHEMBL778076 | 0.81 | AKR1B1 (0.58) | AKR1B1CES2CES1POLBCCR2 | |
| SCHEMBL19519154 | 0.81 | NAMPT (0.48) | AKR1B1KCNH2ALDH1A1PKMPKLR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104530404-A | Preparation method of multifunctional acrylate oligomer | GUANGDONG HEYGEY LIGHT CURING MATERIALS CO LTD | 2015-04-22 | — | — | CN | claimed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | claimed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | claimed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | claimed |
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250321485-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-16 | — | — | US | disclosed |
| EP-3306732-B1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR BATTERIES AND LITHIUM SECONDARY BATTERY | MITSUI CHEMICALS INC (JP) | 2025-06-25 | — | — | EP | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20240369925-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-11-07 | — | — | US | disclosed |
| US-20240369924-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-11-07 | — | — | US | disclosed |
| WO-2024221045-A1 | IMMUNOGENIC COMPOSITION | GRIFFITH UNIVERSITY (AU) | 2024-10-31 | — | — | WO | disclosed |
| WO-2001091775-A2 | PREPARATION OF A PATHOGEN INACTIVATED SOLUTION OF RED BLOOD CELLS HAVING REDUCED IMMUNOGENICITY | CERUS CORPORATION (US) | 2001-12-06 | — | — | WO | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| JP-2001109155-A | RADIATION SENSITIVE RESIN COMPOSITION | JSR CORP | 2001-04-20 | — | — | JP | disclosed |
| EP-0921817-B1 | PEGYLATION PROCESS | POLYMASC PHARMACEUTICALS PLC (GB) | 2001-03-28 | — | — | EP | disclosed |
| EP-0921817-A1 | PEGYLATION PROCESS | PolyMASC Pharmaceuticals plc (GB) | 1999-06-16 | — | — | EP | disclosed |
| WO-1998032466-A1 | PEGYLATION PROCESS | POLYMASC PHARMACEUTICALS PLC (GB) | 1998-07-30 | — | — | WO | disclosed |