SCHEMBL7976314

SCHEMBL7976314

CC(=O)CCC=NO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10501089 0.81 PAOX (0.46)
SCHEMBL4844664 0.76
SCHEMBL22366429 0.75
SCHEMBL16585040 0.74
SCHEMBL7498 0.72
SCHEMBL11794996 0.72 ALDH1A1 (0.50)
SCHEMBL6355833 0.72
SCHEMBL11009268 0.71 ALDH1A1 (0.56)
SCHEMBL11009265 0.71 ALDH1A1 (0.56)
Acetone SCHEMBL8891841 0.70 ALDH1A1 (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108713046-B Aqueous coating composition 关西涂料株式会社 2020-05-22 CN disclosed
US-6280897-B1 GENERATION OF ACID WITH ACTINIC RADIATION KABUSHIKI KAISHA TOSHIBA (JP) 2001-08-28 US disclosed
US-5932391-A CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT KABUSHIKI KAISHA TOSHIBA (JP) 1999-08-03 US disclosed
US-5863699-A FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP KABUSHIKI KAISHA TOSHIBA (JP) 1999-01-26 US disclosed