SCHEMBL7976834

SCHEMBL7976834

CC=C(CC(C)(C)C)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 3/20 0.41
GRIK2 Q13002 2/20 0.41
TET2 Q6N021 1/20 0.38
HMGCR P04035 1/20 0.36
CHRM1 P11229 1/20 0.36
TBXA2R P21731 1/20 0.36
ADRA1A P35348 1/20 0.36
TSHR P16473 3/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
HIF1A Q16665 1/20 0.35
KDM4E B2RXH2 2/20 0.32
FFAR1 O14842 1/20 0.31
CPT2 P23786 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
ALDH1A1 P00352 1/20 0.30
ABAT P80404 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5038779 0.82 TET2 (0.37) GRIK1GRIK2TET2HMGCRCHRM1
SCHEMBL3628410 0.80 TSHR (0.50) GRIK1GRIK2TET2HMGCRCHRM1
SCHEMBL3628412 0.80 TSHR (0.50) GRIK1GRIK2TET2HMGCRCHRM1
SCHEMBL9243879 0.80 TSHR (0.50) GRIK1GRIK2TET2HMGCRCHRM1
SCHEMBL5693402 0.80 GRIK1 (0.38) GRIK1GRIK2TET2HMGCRCHRM1
SCHEMBL19483419 0.77 MIF (0.30)
SCHEMBL19483423 0.77 MIF (0.30)
SCHEMBL7248010 0.77 GRIK1 (0.40) GRIK1GRIK2TET2TSHRKDM4E
SCHEMBL2121629 0.77 GRIK1 (0.40) GRIK1GRIK2TET2TSHRKDM4E
SCHEMBL3842415 0.77 TET2 (0.33) GRIK1TET2HMGCRCHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5908732-A Polymer compositions for high resolution resist applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-06-01 US claimed
US-6280903-B1 PHOTORESISTS OF NORBORNENE SUCCINIC ANHYDRIDE SAMSUNG ELECTRONICS CO., LTD. (KR) 2001-08-28 US disclosed
US-6114084-A COPOLYMERS AND TERPOLYMERS USED IN CHEMICALLY AMPLIFIED RESISTS SAMSUNG ELECTRONICS CO. LTD. (KR) 2000-09-05 US disclosed
EP-0836119-A1 Chemically amplified resist composition Samsung Electronics Co., Ltd. (KR) 1998-04-15 EP disclosed