Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.58 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.58 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.58 |
| ▸ | SLC9A1 | P19634 | 4/20 | 0.55 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.55 |
| ▸ | HDAC3 | O15379 | 3/20 | 0.53 |
| ▸ | HDAC4 | P56524 | 3/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.53 |
| ▸ | HDAC7 | Q8WUI4 | 3/20 | 0.53 |
| ▸ | HDAC2 | Q92769 | 3/20 | 0.53 |
| ▸ | HDAC10 | Q969S8 | 3/20 | 0.53 |
| ▸ | HDAC11 | Q96DB2 | 3/20 | 0.53 |
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.53 |
| ▸ | HDAC6 | Q9UBN7 | 3/20 | 0.53 |
| ▸ | HDAC9 | Q9UKV0 | 3/20 | 0.53 |
| ▸ | HDAC5 | Q9UQL6 | 3/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17664762 | 0.84 | TSHR (0.54) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL736439 | 0.83 | TSHR (0.61) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL29389351 | 0.83 | TSHR (0.61) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL17110689 | 0.81 | TSHR (0.59) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL31483487 | 0.81 | TSHR (0.59) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL23146638 | 0.80 | TSHR (0.54) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL30381386 | 0.80 | NPSR1 (0.50) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL9555168 | 0.80 | NPSR1 (0.50) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL8404027 | 0.79 | TSHR (0.58) | TSHRNPSR1RXFP1SLC9A1KEAP1 | |
| SCHEMBL21104745 | 0.79 | TSHR (0.58) | TSHRNPSR1RXFP1SLC9A1KEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 471 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113589662-B | Composition, stripping liquid, application of stripping liquid in stripping of photoresist or photoresist residues and stripping method | 浙江奥首材料科技有限公司 | 2022-07-12 | — | — | CN | claimed |
| CN-113589662-A | Composition, stripping liquid, application of stripping liquid in stripping of photoresist or photoresist residues and stripping method | 浙江奥首材料科技有限公司 | 2021-11-02 | — | — | CN | claimed |
| CN-107221573-B | Anti-ultraviolet-aging solar cell back panel film and preparation method thereof | 浙江帝恒实业有限公司 | 2019-06-21 | — | — | CN | claimed |
| CN-102037157-B | Adhesion promotion of metal to laminate with a multi-functional compound | ENTHONE | 2014-05-28 | — | — | CN | claimed |
| CN-102037157-A | Adhesion promotion of metal to laminate with a multi-functional compound | ENTHONE | 2011-04-27 | — | — | CN | claimed |
| CN-1860198-B | Non-polymeric organic particles for chemical mechanical polishing | DYNEA CHEMICALS OY | 2010-06-16 | — | — | CN | claimed |
| CN-101437919-A | CMP method for copper-containing substrates | CABOT MICROELECTRONICS CORP (US) | 2009-05-20 | — | — | CN | claimed |
| CN-1860198-A | non-polymeric organic particles for chemical mechanical polishing | DYNEA CHEMICALS OY (FI) | 2006-11-08 | — | — | CN | claimed |
| US-20030199407-A1 | Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution | DUKSUNG CO., LTD. (KR) | 2003-10-23 | — | — | US | claimed |
| US-20250377594-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250321482-A1 | RESIST COMPOSITION, DRY FILM RESIST, METHOD FOR PRODUCING DRY FILM RESIST, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED OBJECT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-09-04 | — | — | US | disclosed |
| US-20250231484-A1 | RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-07-17 | — | — | US | disclosed |
| US-20250197783-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| WO-1998059108-A2 | OXIDATION AND BLEACHING SYSTEM WITH ENZYMATICALLY PRODUCED OXIDIZING AGENTS | BLUME, HILDEGARD (DE) | 1998-12-30 | — | — | WO | disclosed |
| EP-0393721-A2 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-24 | — | — | EP | disclosed |
| US-4719248-A | BENZOTRIAZOLE UNSATURATED AMIDE | BAUSCH & LOMB INCORPORATED (US) | 1988-01-12 | — | — | US | disclosed |
| EP-0221630-A2 | Ultraviolet blocking agents for contact lenses | BAUSCH & LOMB INCORPORATED (US) | 1987-05-13 | — | — | EP | disclosed |
| EP-0190920-A2 | Method of enhancing memory or correcting memory deficiency with arylamido (and arylthioamido)azabicycloalkanes | SYNTHELABO (FR) | 1986-08-13 | — | — | EP | disclosed |
| EP-0144087-A2 | Heat-developable color light-sensitive material | KONICA CORPORATION (JP) | 1985-06-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250278022-A1 | COMPOUND, POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ABCC1, SLC11A2, RER1 | TSHR 4478/4885NPSR1 976/4885RXFP1 973/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.