SCHEMBL799025

SCHEMBL799025

CC(F)(I)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3385002 0.80
SCHEMBL1036831 0.78
SCHEMBL123550 0.78
SCHEMBL1040192 0.78
SCHEMBL9508050 0.76
SCHEMBL5821262 0.73 LMNA (0.40)
SCHEMBL16230134 0.73
SCHEMBL22931457 0.70
SCHEMBL21190696 0.70
SCHEMBL1413848 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120137738-A Compositions comprising iodofluorocarbons 阿科玛法国公司 2025-06-13 CN claimed
CN-119977753-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-13 CN claimed
CN-119954594-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN claimed
CN-119954592-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN claimed
US-20230114828-A1 COMPOSITION COMPRISING AN IODOFLUOROCARBON COMPOUND ARKEMA FRANCE (FR) 2023-04-13 US claimed
US-20230075839-A1 METHOD FOR PRODUCING AN IODOFLUOROALKANE COMPOUND ARKEMA FRANCE (FR) 2023-03-09 US claimed
EP-4107140-A1 METHOD FOR PRODUCING AN IODOFLUOROALKANE COMPOUND ARKEMA FRANCE (FR) 2022-12-28 EP claimed
US-10714325-B2 Glow discharge ion source MICROMASS UK LIMITED (GB) 2020-07-14 US claimed
US-9500607-B2 Glow discharge ion source MICROMASS UK LIMITED (GB) 2016-11-22 US claimed
US-20140051181-A1 Glow Discharge Ion Source MICROMASS UK LIMITED (GB) 2014-02-20 US claimed
EP-2667401-A1 Glow discharge ion source Micromass UK Limited (GB) 2013-11-27 EP claimed
CN-120137738-A Compositions comprising iodofluorocarbons 阿科玛法国公司 2025-06-13 CN disclosed
CN-119977753-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-13 CN disclosed
CN-119954596-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN disclosed
CN-119954594-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-09 CN disclosed
US-20120175137-A1 Fire extinguishing agents, methods for preventing and/or extinguishing combustion, fire extinguishing systems, and production processes E. I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2012-07-12 US disclosed
US-20120071689-A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS E.I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2012-03-22 US disclosed
US-20110189788-A1 Glow Discharge Ion Source MICROMASS UK LIMITED (GB) 2011-08-04 US disclosed
EP-2308076-A2 GLOW DISCHARGE ION SOURCE Micromass UK Limited (GB) 2011-04-13 EP disclosed
WO-2010012987-A2 GLOW DISCHARGE ION SOURCE MICROMAS UK LIMITED (GB) 2010-02-04 WO disclosed