Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1526525 | 0.80 | POLB (0.37) | POLBKDM4ESMN1; SMN2MAPK1ALDH1A1 | |
| SCHEMBL1526521 | 0.80 | POLB (0.37) | POLBKDM4ESMN1; SMN2MAPK1ALDH1A1 | |
| SCHEMBL26968347 | 0.80 | POLB (0.37) | POLBKDM4ESMN1; SMN2MAPK1ALDH1A1 | |
| SCHEMBL5950782 | 0.77 | — | — | |
| SCHEMBL1251003 | 0.77 | — | — | |
| SCHEMBL14470625 | 0.77 | — | — | |
| SCHEMBL16808523 | 0.73 | — | — | |
| SCHEMBL319925 | 0.73 | — | — | |
| SCHEMBL7986814 | 0.73 | — | — | |
| SCHEMBL13093541 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8283103-B2 | Composition for forming resist underlayer film for lithography and production method of semiconductor device | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20110045404-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-6262073-B1 | INHIBITING THE ACTION OF A PRO-INFLAMMATORY CYTOKINE | OXIS INTERNATIONAL INC. | 2001-07-17 | — | — | US | disclosed |
| US-6136832-A | RACEMIC MIXTURES AND ENANTIOMORPHS | OXIS INTERNATIONAL INC. (US) | 2000-10-24 | — | — | US | disclosed |
| US-6005000-A | 5,5-Disubstituted-3, 4-dihydroxy-2(5H)-furanones and methods of use therefor | OXIS INTERNATIONAL, INC. (US) | 1999-12-21 | — | — | US | disclosed |
| EP-0938482-A1 | 5-SUBSTITUTED AND 5,5-DISUBSTITUTED-3,4-DIHYDROXY-2(5H)-FURANONES AND METHODS OF USE THEREFOR | Oxis International, Inc. (US) | 1999-09-01 | — | — | EP | disclosed |
| WO-1998007714-A1 | 5-SUBSTITUTED AND 5,5-DISUBSTITUTED-3,4-DIHYDROXY-2(5H)-FURANONES AND METHODS OF USE THEREFOR | OXIS INTERNATIONAL, INC. (US) | 1998-02-26 | — | — | WO | disclosed |