⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL422022 | 1.00 | — | — | |
| SCHEMBL420981 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL5307165 | 0.97 | — | — | |
| Ammonia Solution, Strong SCHEMBL15813800 | 0.97 | — | — | |
| SCHEMBL1742973 | 0.80 | KMT2A (0.35) | — | |
| SCHEMBL18868480 | 0.76 | — | — | |
| SCHEMBL1356839 | 0.74 | — | — | |
| SCHEMBL22068853 | 0.74 | — | — | |
| SCHEMBL72690 | 0.74 | — | — | |
| SCHEMBL16905406 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 619 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| CN-120020120-A | Method for producing N- (2-acyloxyalkyl) amides and use thereof | 中国石油化工股份有限公司 | 2025-05-20 | — | — | CN | claimed |
| CN-120020114-A | Preparation method of N-alkenyl amide compound | 中国石油化工股份有限公司 | 2025-05-20 | — | — | CN | claimed |
| CN-119978177-A | Raw material composition of solid titanium catalyst component, catalyst, preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-118223024-A | Etching solution for copper thick film | 松下知识产权经营株式会社 | 2024-06-21 | — | — | CN | claimed |
| CN-117964824-B | Multiple stimulus responsive homopolymer and preparation method and application thereof | 天津师范大学 | 2024-05-28 | — | — | CN | claimed |
| CN-117964824-A | Multiple stimulus responsive homopolymer and preparation method and application thereof | 天津师范大学 | 2024-05-03 | — | — | CN | claimed |
| CN-117778012-A | Stripping liquid composition for IGZO substrate, preparation method thereof and semiconductor element | 易安爱富科技有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-112859552-B | Application of vanadium oxide corrosion inhibition fluorine-containing stripping liquid | 上海新阳半导体材料股份有限公司 | 2024-01-05 | — | — | CN | claimed |
| WO-2008070016-A2 | INHIBITORS OF AKT ACTIVITY | MERCK & CO., INC. (US) | 2008-06-12 | — | — | WO | claimed |
| WO-2008042639-A1 | COMPOUNDS AND COMPOSITIONS AS PROTEIN KINASE INHIBITORS | IRM LLC (BM) | 2008-04-10 | — | — | WO | claimed |
| EP-1887007-A2 | Novel compounds | AstraZeneca AB (SE) | 2008-02-13 | — | — | EP | claimed |
| EP-1625126-B1 | IMIDAZO AND THIAZOLOPYRIDINES AS JAK3 KINASE INHIBITORS | ASTRAZENECA AB (SE) | 2008-01-16 | — | — | EP | claimed |
| US-7179300-B2 | Cosmetic composition containing sulfinic acid derivatives | L'OREAL S.A. (FR) | 2007-02-20 | — | — | US | claimed |
| US-20060287355-A1 | Imidazo and thiazolopyridines as jak3 kinase inhibitors | ASTRAZENECA AB (SE) | 2006-12-21 | — | — | US | claimed |
| EP-1625126-A1 | IMIDAZO AND THIAZOLOPYRIDINES AS JAK3 KINASE INHIBITORS | AstraZeneca AB (SE) | 2006-02-15 | — | — | EP | claimed |
| WO-2004099204-A1 | IMIDAZO AND THIAZOLOPYRIDINES AS JAK3 KINASE INHIBITORS | ASTRAZENECA AB (SE) | 2004-11-18 | — | — | WO | claimed |
| EP-1077931-B1 | BENZAMIDE DERIVATIVES FOR THE TREATMENT OF DISEASES MEDIATED BY CYTOKINES | ASTRAZENECA AB (SE) | 2004-11-17 | — | — | EP | claimed |
| US-20040137379-A1 | Photoresist stripping agent | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-07-15 | — | — | US | claimed |