SCHEMBL7994147

SCHEMBL7994147

CCOC=CC(=O)Oc1ccccc1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.42
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42
HSD17B10 Q99714 1/20 0.42
TDP1 Q9NUW8 2/20 0.41
ATM Q13315 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
NPSR1 Q6W5P4 1/20 0.39
PPARG P37231 1/20 0.38
BCHE P06276 1/20 0.38
ALDH1A1 P00352 1/20 0.37
RXRA P19793 1/20 0.37
RXRB P28702 1/20 0.37
RXRG P48443 1/20 0.37
NOTUM Q6P988 1/20 0.37
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37
USP2 O75604 1/20 0.37
LMNA P02545 1/20 0.37
MCL1 Q07820 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10339829 0.83 KDM4E (0.58) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL11556996 0.83 KDM4E (0.58) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL8166076 0.83 KDM4E (0.58) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL6265291 0.82 KDM4E (0.46) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL4102451 0.81 KDM4E (0.43) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL1877572 0.80 ZDHHC2 (0.49) KDM4EMAPTHPGDHSD17B10ALDH1A1
SCHEMBL1877571 0.80 ZDHHC2 (0.49) KDM4EMAPTHPGDHSD17B10ALDH1A1
SCHEMBL8166087 0.77 KDM4E (0.56) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL8166080 0.77 KDM4E (0.56) KDM4EMAPTHPGDHSD17B10TDP1
SCHEMBL6157338 0.76 THRA (0.68) PPARGTHRATHRBMCL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6296916-B1 ANTISTATIC HARD COATINGS, LOW CURING SHRINKAGE, LOW VISCOSITY MITSUBISHI RAYON CO., LTD. (JP) 2001-10-02 US disclosed
US-6066684-A A PHOTOPOLYMERIZABLE MONOMER COMPRISING A MIXTURE OF (METH)ACRYLIC ACID ESTER MONOMER CONTAINING 2, 1, OR ONE ESTER GROUPS WITH HYDROXY AND ATLEAST AN ESTER HAVING NOHYDROXY GROUP AND PERFLUOROCARBOXYLIC OR SULFONIC METAL SALT MITSUBISHI RAYON CO., LTD. (JP) 2000-05-23 US disclosed