SCHEMBL7994299

SCHEMBL7994299

C=C(C(=O)O)C(C(=O)O)C12CCC(CC1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6649780 0.81
SCHEMBL23495517 0.79 NPC1 (0.32)
SCHEMBL5988117 0.69 GRM1 (0.45)
Hydrochloric Acid SCHEMBL5987774 0.68 GRM1 (0.44)
SCHEMBL9799212 0.67 NPC1 (0.33)
SCHEMBL6653204 0.67 TSHR (0.33)
SCHEMBL6682124 0.66 EPHX1 (0.33)
SCHEMBL20530261 0.65 SLC1A2 (0.33)
SCHEMBL2026426 0.64 ALDH1A1 (0.38)
SCHEMBL4028622 0.63 ALDH1A1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6287746-B1 PHOTOACID GENERATOR NEC CORPORATION (JP) 2001-09-11 US disclosed
US-6030747-A CHEMICALLY AMPLIFIED RESIST CONSISTS OF A PHOTOACID GENERATOR, A CROSSLINKING AGENT ACTIVATED IN PRESENCE OF ACID AND A COPOLYMER OF ACRYLIC OR METHACRYLIC ESTER CONTAINING AN ACID, HYDROXY OR ESTER POLAR GROUP AND A COMPOUND NEC CORPORATION (JP) 2000-02-29 US disclosed