SCHEMBL799996

SCHEMBL799996

C=C(O)C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13935642 1.00
SCHEMBL12657749 1.00
SCHEMBL8122791 0.75
SCHEMBL249125 0.73
SCHEMBL12898949 0.73
SCHEMBL12096028 0.73
SCHEMBL624913 0.72
SCHEMBL14338128 0.72 BLM (0.42)
SCHEMBL22667794 0.72 ENPEP (0.33)
SCHEMBL791557 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116462578-B Method for synthesizing delta-methyl ketone by one-pot method 万华化学集团股份有限公司 2024-04-09 CN claimed
CN-116462578-A Method for synthesizing delta-methyl ketone by one-pot method 万华化学集团股份有限公司 2023-07-21 CN claimed
CN-116462578-B Method for synthesizing delta-methyl ketone by one-pot method 万华化学集团股份有限公司 2024-04-09 CN disclosed
US-11840591-B2 In situ peelable protective barrier films Sanipeel, LLC (US) 2023-12-12 US disclosed
CN-116462578-A Method for synthesizing delta-methyl ketone by one-pot method 万华化学集团股份有限公司 2023-07-21 CN disclosed
US-8546062-B2 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-01 US disclosed
US-8309505-B2 Hand dish composition in the form of an article THE PROCTER & GAMBLE COMPANY (US) 2012-11-13 US disclosed
US-20120070782-A1 SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-22 US disclosed
US-20110028373-A1 HAND DISH COMPOSITION IN THE FORM OF AN ARTICLE THE PROCTER & GAMBLE COMPANY 2011-02-03 US disclosed
WO-2010067905-A2 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-06-17 WO disclosed
US-20100137595-A1 VAGINAL ODORANTS FRAUNHOFER-GESELLSHCAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2010-06-03 US disclosed
EP-1452521-A1 CYCLIC COMPOUND AND PPAR AGONIST Eisai Co., Ltd. (JP) 2004-09-01 EP disclosed
US-20040138271-A1 Benzene compound and salt thereof EISAI R&D MANAGEMENT CO., LTD. (JP) 2004-07-15 US disclosed
US-20040102634-A1 Carboxylic acid derivative and salt thereof EISAI R&D MANAGEMENT CO., LTD. (JP) 2004-05-27 US disclosed
EP-1394147-A1 CARBOXYLIC ACID DERIVATIVE AND MEDICINE COMPRISING SALT OR ESTER OF THE SAME Eisai Co., Ltd. (JP) 2004-03-03 EP disclosed
EP-1380562-A1 CARBOXYLIC ACID DERIVATIVE AND SALT THEREOF Eisai Co., Ltd. (JP) 2004-01-14 EP disclosed
EP-1375472-A1 BENZENE COMPOUND AND SALT THEREOF Eisai Co., Ltd. (JP) 2004-01-02 EP disclosed
EP-1216980-A1 CARBOXYLIC ACID DERIVATIVES AND DRUGS CONTAINING THE SAME Eisai Co., Ltd. (JP) 2002-06-26 EP disclosed
US-4207088-A PREEMERGENCE AND POSTEMERGENCE CONTROL FMC CORPORATION (US) 1980-06-10 US disclosed
US-4035178-A Herbicidal 1,3-dioxanes FMC CORPORATION (US) 1977-07-12 US disclosed